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Self-catalyzed Growth of InAs Nanowires on InP Substrate

机译:InP衬底上InAs纳米线的自催化生长

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摘要

We report on the self-catalyzed growth of InAs nanowires on InP substrate by metal-organic chemical vapor deposition. At a moderate V/III ratio, tapered nanowires are obtained, suggesting a strong surface diffusion effect. Dense twin faults are observed perpendicular to the nanowire growth direction due to the fluctuation of In atoms in the droplet originating from the surface diffusion effect. At a lower V/III ratio, the nanowires exhibit kinking, which is associated with a high adhesion due to a large sticking coefficient of TMIn. The twin faults are dramatically suppressed and even completely eliminated in the NW branch after kinking, which is attributed to a stable In supply with a negligible diffusion effect. This work provides a method for the fabrication of defect-free InAs nanowires.
机译:我们报告了通过金属有机化学气相沉积在InP衬底上InAs纳米线的自催化生长。在中等的V / III比下,可获得渐缩的纳米线,这表明其具有很强的表面扩散作用。由于源自表面扩散效应的液滴中In原子的波动,垂直于纳米线的生长方向观察到密集的孪生断层。在较低的V / III比下,纳米线表现出扭结,这是由于TMIn的大粘附系数而导致的高附着力。扭结后,NW分支中的孪生断层得到了显着抑制,甚至被完全消除了,这归因于稳定的In供应,而扩散效应可忽略不计。这项工作提供了一种制造无缺陷InAs纳米线的方法。

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