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First-Principles Study of Point Defects in GaAs/AlAs Superlattice: the Phase Stability and the Effects on the Band Structure and Carrier Mobility

机译:GaAs / AlAs超晶格中点缺陷的第一性原理研究:相稳定性及其对能带结构和载流子迁移率的影响

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摘要

Advanced semiconductor superlattices play important roles in critical future high-tech applications such as aerospace, high-energy physics, gravitational wave detection, astronomy, and nuclear related areas. Under such extreme conditions like high irradiative environments, these semiconductor superlattices tend to generate various defects that ultimately may result in the failure of the devices. However, in the superlattice like GaAs/AlAs, the phase stability and impact on the device performance of point defects are still not clear up to date. The present calculations show that in GaAs/AlAs superlattice, the antisite defects are energetically more favorable than vacancy and interstitial defects. The AsX (X = Al or Ga) and XAs defects always induce metallicity of GaAs/AlAs superlattice, and GaAl and AlGa antisite defects have slight effects on the electronic structure. For GaAs/AlAs superlattice with the interstitial or vacancy defects, significant reduction of band gap or induced metallicity is found. Further calculations show that the interstitial and vacancy defects reduce the electron mobility significantly, while the antisite defects have relatively smaller influences. The results advance the understanding of the radiation damage effects of the GaAs/AlAs superlattice, which thus provide guidance for designing highly stable and durable semiconductor superlattice based electronic and optoelectronics for extreme environment applications.
机译:先进的半导体超晶格在诸如航空航天,高能物理,引力波检测,天文学和核相关领域等未来的重要高科技应用中起着重要作用。在诸如高辐射环境之类的极端条件下,这些半导体超晶格往往会产生各种缺陷,最终可能导致器件故障。但是,在像GaAs / AlAs这样的超晶格中,相位稳定性以及对点缺陷对器件性能的影响目前尚不清楚。目前的计算表明,在GaAs / AlAs超晶格中,反位缺陷在能量上比空位和间隙缺陷更有利。 AsX(X = Al或Ga)和XAs缺陷总是会诱发GaAs / AlAs超晶格的金属性,而GaAl和AlGa反位缺陷对电子结构的影响很小。对于具有间隙或空位缺陷的GaAs / AlAs超晶格,发现带隙或诱导金属性明显降低。进一步的计算表明,间隙和空位缺陷会显着降低电子迁移率,而反位缺陷的影响相对较小。结果进一步了解了GaAs / AlAs超晶格的辐射损伤效应,从而为设计用于极端环境应用的高度稳定和耐用的基于半导体超晶格的电子和光电子学提供了指导。

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