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Strain induced topological phase transitions in monolayer honeycomb structures of group-V binary compounds

机译:V族二元化合物单层蜂窝结构中的应变诱导拓扑相变

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摘要

We present first-principles calculations of electronic structures of a class of two-dimensional (2D) honeycomb structures of group-V binary compounds. Our results show these new 2D materials are stable semiconductors with direct or indirect band gaps. The band gap can be tuned by applying lattice strain. During their stretchable regime, they all exhibit metal-indirect gap semiconductor-direct gap semiconductor-topological insulator (TI) transitions with increasing strain from negative (compressive) to positive (tensile) values. The topological phase transition results from the band inversion at the Γ point which is due to the evolution of bonding and anti-bonding states under lattice strain.
机译:我们目前的第一性原理计算是V型二元化合物的一类二维(2D)蜂窝结构的电子结构。我们的结果表明,这些新型2D材料是具有直接或间接带隙的稳定半导体。可以通过施加晶格应变来调节带隙。在它们的可拉伸状态期间,它们都显示出金属-间接间隙半导体-直接间隙半导体拓扑绝缘体(TI)的转变,其应变从负(压缩)值到正(拉伸)值都增加。拓扑相变是由Γ点处的能带反转导致的,这是由于晶格应变下键合态和反键态的演化所致。

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