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Wavelength-dependent Optical Instability Mechanisms and Decay Kinetics in Amorphous Oxide Thin-Film Devices

机译:非晶氧化物薄膜器件中与波长有关的光学不稳定性机理和衰减动力学

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摘要

We present a study on decay kinetics for a recovery process depending on the light wavelength selected in optical instability measurements against amorphous In-Ga-Zn-O (a-IGZO) thin-film devices. To quantitatively analyze optically-induced instability behaviors, a stretched exponential function (SEF) and its inverse Laplace transform are employed for a time- and energy-dependent analysis, respectively. The analyzed results indicate that a shorter wavelength light activates electrons largely from the valence band while metastable states are deionized with the respective photon energy (hv). In contrast, a longer wavelength illumination is mainly activating trapped electrons at metastable states, e.g. oxygen defects. In particular, at 500 nm wavelength (hv ~ 2.5 eV), it shows an early persistency with a much higher activation energy. This also implies that the majority of metastable states remain ionized, thus the deionization energy >2.5 eV. However, the decay trend at 600 nm wavelength (hv ~ 2 eV) is found to be less persistent and lower current level compared to the case at 500 nm wavelength, suggesting the ionization energy of metastable states >2 eV. Finally, it is deduced that majority of oxygen defects before the illumination reside within the energy range between 2 eV and 2.5 eV from the conduction band edge.
机译:我们针对恢复过程的衰减动力学进行了研究,具体取决于对非晶In-Ga-Zn-O(a-IGZO)薄膜器件的光学不稳定性测量中选择的光波长。为了定量分析光诱导的不稳定性行为,分别采用拉伸指数函数(SEF)及其逆Laplace变换进行时间和能量相关分析。分析结果表明,波长较短的光主要从价带激活电子,而亚稳态则被各自的光子能量(hv)去离子。相反,较长波长的照明主要是激活处于亚稳态的俘获电子,例如处于稳态。氧缺陷。尤其是在500 nm波长(hv〜2.5 eV)下,它显示出早期持久性,并具有更高的活化能。这也意味着大多数亚稳态保持电离,因此去离子能量> 2.5 eV。然而,与在500 nm波长的情况相比,在600 nm波长(hv〜2 eV)处的衰减趋势不那么持久,电流水平更低,这表明亚稳态> 2 eV的电离能。最后,可以推论出照明前的大多数氧缺陷都位于从导带边缘起2 eV至2.5 eV的能量范围内。

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