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Controlling destructive quantum interference in tunneling junctions comprising self-assembled monolayers via bond topology and functional groups

机译:通过键拓扑和官能团控制包括自组装单分子层的隧道结中的破坏性量子干扰

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摘要

Quantum interference effects (QI) are of interest in nano-scale devices based on molecular tunneling junctions because they can affect conductance exponentially through minor structural changes. However, their utilization requires the prediction and deterministic control over the position and magnitude of QI features, which remains a significant challenge. In this context, we designed and synthesized three benzodithiophenes based molecular wires; one linearly-conjugated, one cross-conjugated and one cross-conjugated quinone. Using eutectic Ga–In (EGaIn) and CP-AFM, we compared them to a well-known anthraquinone in molecular junctions comprising self-assembled monolayers (SAMs). By combining density functional theory and transition voltage spectroscopy, we show that the presence of an interference feature and its position can be controlled independently by manipulating bond topology and electronegativity. This is the first study to separate these two parameters experimentally, demonstrating that the conductance of a tunneling junction depends on the position and depth of a QI feature, both of which can be controlled synthetically.
机译:量子干扰效应(QI)在基于分子隧道结的纳米级器件中引起人们的关注,因为它们可以通过微小的结构变化以指数方式影响电导。但是,它们的利用要求对QI特征的位置和大小进行预测和确定性控制,这仍然是一个重大挑战。在这种情况下,我们设计并合成了三种基于苯并二噻吩的分子丝;一种线性共轭,一种交叉共轭和一种交叉共轭的醌。使用共晶Ga-In(EGaIn)和CP-AFM,我们将它们与包括自组装单分子膜(SAMs)的分子连接处的蒽醌进行了比较。通过结合密度泛函理论和跃迁电压光谱,我们表明,可以通过操纵键拓扑和电负性来独立控制干涉特征及其位置的存在。这是第一项通过实验分离这两个参数的研究,表明隧道结的电导率取决于QI特征的位置和深度,两者均可综合控制。

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