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Method of applying EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, an optical element with a self-assembled monolayer, a self-assembled monolayer, the device manufacturing method
Method of applying EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, an optical element with a self-assembled monolayer, a self-assembled monolayer, the device manufacturing method
A lithographic apparatus contains an optical element, the surface of the optical element being modified to reduce the effects of reflectivity reduction by molecular contamination. The surface includes a self assembled monolayer.
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