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Origin of Room-Temperature Ferromagnetism in Hydrogenated Epitaxial Graphene on Silicon Carbide

机译:碳化硅上氢化外延石墨烯中室温铁磁性的起源

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摘要

The discovery of room-temperature ferromagnetism of hydrogenated epitaxial graphene on silicon carbide challenges for a fundamental understanding of this long-range phenomenon. Carbon allotropes with their dispersive electron states at the Fermi level and a small spin-orbit coupling are not an obvious candidate for ferromagnetism. Here we show that the origin of ferromagnetism in hydrogenated epitaxial graphene with a relatively high Curie temperature (>300 K) lies in the formation of curved specific carbon site regions in the graphene layer, induced by the underlying Si-dangling bonds and by the hydrogen bonding. Hydrogen adsorption is therefore more favourable at only one sublattice site, resulting in a localized state at the Fermi energy that can be attributed to a pseudo-Landau level splitting. This n = 0 level forms a spin-polarized narrow band at the Fermi energy leading to a high Curie temperature and larger magnetic moment can be achieved due to the presence of Si dangling bonds underneath the hydrogenated graphene layer.
机译:在碳化硅上氢化外延石墨烯的室温铁磁性的发现对这一远距离现象的基本理解提出了挑战。碳同素异形体在费米能级上具有分散的电子态,并且自旋轨道耦合较小,并不是铁磁性的明显候选者。在这里,我们表明,具有较高居里温度(> 300 K)的氢化外延石墨烯中的铁磁性起源在于石墨烯层中弯曲的特定碳位点区域的形成,这是由下面的Si悬挂键和氢引起的。粘接。因此,氢的吸附仅在一个亚晶格位置更为有利,从而导致费米能量处于局部状态,这可以归因于伪兰道能级分裂。该n = 0能级在费米能量处形成自旋极化的窄带,从而导致居里温度高,并且由于在氢化石墨烯层下方存在Si悬空键,因此可以实现更大的磁矩。

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