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A 5 g Inertial Micro-Switch with Enhanced Threshold Accuracy Using Squeeze-Film Damping

机译:采用挤压膜阻尼的5 g惯性微动开关具有更高的阈值精度

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摘要

Our previous report based on a 10 g (gravity) silicon-based inertial micro-switch showed that the contact effect between the two electrodes can be improved by squeeze-film damping. As an extended study toward its potential applications, the switch with a large proof mass suspended by four flexible serpentine springs was redesigned to achieve 5 g threshold value and enhanced threshold accuracy. The impact of the squeeze-film damping on the threshold value was theoretically studied. The theoretical results show that the threshold variation from the designed value due to fabrication errors can be reduced by optimizing the device thickness (the thickness of the proof mass and springs) and then establishing a tradeoff between the damping and elastic forces, thus improving the threshold accuracy. The design strategy was verified by FEM (finite-element-method) simulation and an experimental test. The simulation results show that the maximum threshold deviation was only 0.15 g, when the device thickness variation range was 16–24 μm, which is an adequately wide latitude for the current bulk silicon micromachining technology. The measured threshold values were 4.9–5.8 g and the device thicknesses were 18.2–22.5 μm, agreeing well with the simulation results. The measured contact time was 50 μs which is also in good agreement with our previous work.
机译:我们以前的基于10 g(重力)硅基惯性微动开关的报告显示,通过挤压膜阻尼可以改善两个电极之间的接触效果。作为对其潜在应用的扩展研究,重新设计了具有由四个柔性蛇形弹簧悬挂的大质量负载的开关,以实现5 g阈值和增强的阈值精度。从理论上研究了挤压膜阻尼对阈值的影响。理论结果表明,通过优化器件厚度(检测质量和弹簧的厚度),然后在阻尼力和弹性力之间进行权衡,可以减小由于制造误差而导致的阈值与设计值的偏差,从而提高阈值准确性。通过有限元方法(FEM)仿真和实验测试验证了该设计策略。仿真结果表明,当器件厚度变化范围为16–24μm时,最大阈值偏差仅为0.15 g,对于当前的体硅微加工技术而言,这是一个足够宽的范围。测得的阈值为4.9–5.8 g,器件厚度为18.2–22.5μm,与仿真结果非常吻合。测得的接触时间为50μs,也与我们以前的工作非常吻合。

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