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A Low-G Silicon Inertial Micro-Switch with Enhanced Contact Effect Using Squeeze-Film Damping

机译:利用挤压膜阻尼增强接触效果的低G硅惯性微动开关

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摘要

Contact time is one of the most important properties for inertial micro-switches. However, it is usually less than 20 μs for the switch with rigid electrode, which is difficult for the external circuit to recognize. This issue is traditionally addressed by designing the switch with a keep-close function or flexible electrode. However, the switch with keep-close function requires an additional operation to re-open itself, causing inconvenience for some applications wherein repeated monitoring is needed. The switch with a flexible electrode is usually fabricated by electroplating technology, and it is difficult to realize low-g switches (<50 g) due to inherent fabrication errors. This paper reports a contact enhancement using squeeze-film damping effect for low-g switches. A vertically driven switch with large proof mass and flexible springs was designed based on silicon micromachining, in order to achieve a damping ratio of 2 and a threshold value of 10 g. The proposed contact enhancement was investigated by theoretical and experimental studies. The results show that the damping effect can not only prolong the contact time for the dynamic acceleration load, but also reduce the contact bounce for the quasi-static acceleration load. The contact time under dynamic and quasi-static loads was 40 μs and 570 μs, respectively.
机译:接触时间是惯性微动开关最重要的特性之一。但是,带有刚性电极的开关通常小于20μs,这对于外部电路来说很难识别。传统上,通过设计具有保持关闭功能或柔性电极的开关来解决此问题。但是,具有保持闭合功能的开关需要额外的操作才能重新打开自身,这给需要重复监视的某些应用带来了不便。带柔性电极的开关通常通过电镀技术制造,由于固有的制造误差,很难实现低克开关(<50 g)。本文报道了采用挤压膜阻尼效应的低g开关的接触增强。为了实现2的阻尼比和10 g的阈值,基于硅微机械加工设计了具有较大质量和柔性弹簧的垂直驱动开关。通过理论和实验研究对提出的接触增强进行了研究。结果表明,阻尼作用不仅可以延长动加速载荷的接触时间,而且可以减小准静态加速载荷的接触弹跳。动态和准静态负载下的接触时间分别为40μs和570μs。

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