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Near-UV electroluminescence in unipolar-doped bipolar-tunneling GaN/AlN heterostructures

机译:单极掺杂双极隧穿GaN / AlN异质结构中的近紫外电致发光

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摘要

Cross-gap light emission is reported in n-type unipolar GaN/AlN double-barrier heterostructure diodes at room temperature. Three different designs were grown on semi-insulating bulk GaN substrates using molecular beam epitaxy (MBE). All samples displayed a single electroluminescent spectral peak at 360 nm with full-width at half-maximum (FWHM) values no greater than 16 nm and an external quantum efficiency (EQE) of ≈0.0074% at 18.8 mA. In contrast to traditional GaN light emitters, p-type doping and p-contacts are completely avoided, and instead, holes are created in the GaN on the emitter side of the tunneling structure by direct interband (that is, Zener) tunneling from the valence band to the conduction band on the collector side. The Zener tunneling is enhanced by the high electric fields (~5 × 106 V cm−1) created by the notably large polarization-induced sheet charge at the interfaces between the AlN and GaN.
机译:在室温下,据报道在n型单极GaN / AlN双势垒异质结构二极管中出现了跨隙发光。使用分子束外延(MBE)在半绝缘的块状GaN衬底上生长了三种不同的设计。所有样品均在360 nm处显示单个电致发光光谱峰,半峰全宽(FWHM)值不大于16 nm,在18.8 mA处的外部量子效率(EQE)约为0.0074%。与传统的GaN发光体相比,完全避免了p型掺杂和p接触,而是通过价态的直接带内(即齐纳)隧穿在GaN隧道结构的发射器侧产生了空穴带到集电极侧的导带。在高电场(〜5×10 6 V cm -1 )产生的高电场增强了齐纳隧穿,该电场在两极之间的界面处产生了很大的极化感应薄层电荷。 AlN和GaN。

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