氢等离子体与水合肼还原氧化石墨烯电容性能的比较

摘要

Two different kinds of reduced graphene oxide was prepared through hydrogen plasma and hydrazine hy-drate reducing graphene oxide. The morphology and structure of reduced graphene oxide was characterized by Transmis-sion Electron Microscope(TEM),X-Ray Powder Diffraction and Raman spectrum. The capacitive performance of reduced graphene oxide was investigated by cyclic voltammetry,galvanostatic charging-discharging and electro-chemical imped-ance spectroscopy. The result shows that Hydrazine hydrate reduction can make the product form favorable three dimen-sional structure,which can enhance the ion transportation ability of graphene. And the degree of reduction is high. Hydro-gen plasma reduction,which needs less time,safe and reliable,can reduce the structure destruction during the reduction process. When the charging-discharging current density is 1 A/g,the specific capacitance of hydrogen plasma reducing graphene oxide can reach 178 F/g,while the specific capacitance of hydrazine hydrate reducing graphene is 119 F/g.%分别通过氢等离子体和水合肼对氧化石墨烯进行还原处理，制成两种不同的还原型氧化石墨烯。采用透射电子显微镜、X射线粉末衍射仪和拉曼光谱对其形貌和结构进行表征。根据循环伏安、恒电流充放电和电化学阻抗谱，并比较在1 mol/L硫酸中的超级电容性能。结果表明，水合肼还原可以形成良好的三维结构，增强石墨烯的离子扩散能力，并且还原程度高。氢等离子体还原耗时少、安全可靠，减少在还原过程中对石墨烯片层结构造成损害。当充放电电流密度为1 A/g时，氢等离子体还原氧化石墨烯的比电容值可以达到178 F/g，而水合肼还原氧化石墨烯比电容值达到了119 F/g。