纳米金刚石薄膜的掺杂与电学性能研究

摘要

The authors review their recent work on the doping and electrical properties of nano-crystalline diamond films.The effects of ion implantation and limited thermal oxi-dized annealing on the microstructure and electrical properties of nanocrystalline diamond films are analyzed.The n-type nanocrystalline diamond films with high mobility were successfully prepared.The results have significance in the applications of nanocrystalline diamond films in electronic devices and electrochemical electrodes.%文章综述了作者近年来在纳米金刚石薄膜掺杂和电学性能等方面的研究工作;阐述了采用离子注入方法及有限热氧化退火处理对纳米金刚石薄膜微结构和电学性能的影响,以及获得的高迁移率 n型电导纳米金刚石薄膜.研究结果对于实现纳米金刚石薄膜在电子器件、电化学电极等领域的应用具有一定的价值.