首页> 中文期刊> 《纺织科技进展》 >用磁控溅射法制备纳米膜防辐射布的工艺探讨

用磁控溅射法制备纳米膜防辐射布的工艺探讨

         

摘要

利用磁控溅射技术在涤纶无纺布表面沉积纳米结构银薄膜,以制得防辐射布。探讨了靶基距、溅射功率、工作气压和进气量等工艺条件对薄膜屏蔽效能的影响。结果表明在时间规定条件下,对屏蔽效能影响大小的排序是:工作气压〉靶基距〉进气量〉溅射功率。%The nano structure silver membranes were deposited on the surface of polyester nonwoven by magnetron sputtering technology to prepare the anti-radiation cloth.Then it discassed the effects of the target-based distance,sputtering power,work pressure,air capacity for the effectiveness of anti-radiation cloth.The results showed that under the condition of prescribed time,the sort in size of the effects from the factors for the effectiveness of anti-radiation cloth was: work pressure,target-based distance,air capacity,sputtering power.

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