低能电子光刻的蒙特卡罗模拟

摘要

@@ Electron beam lithography(EBL)has been playing an important role in the fabrication of large-scale integrated semiconductor devices because of its high resolution.Although high-energy electrons are widely employed in the present EBL system,high-energy electrons can penetrate through the resist layer,lose most of their energies in the substrate and,thus,cause damage to the underlying substrate.