直流磁过滤电弧源沉积氧化钛薄膜的光学特性

摘要

为了探索电弧源离子镀技术制备的氧化钛薄膜的透射率、消光系数和折射率,利用直流磁过滤电弧源在K9玻璃基底上制备了氧化钛薄膜,通过分光光度计和椭偏仪对薄膜的透射率、折射率和消光系数等光学特性和沉积速率进行分析研究.研究结果表明:波长在400～700nm之间,氧化钛薄膜的折射率为2.3389～2.1189；消光系数在10-3数量级上,消光系数小,薄膜吸收小,薄膜峰值透射率接近K9基底的透射率；沉积时间30min,薄膜的厚度是678.2nm,电弧源离子镀技术沉积氧化钛薄膜的平均速率为22.6nm/min.%To search magnetic filtration DC arc ion plating technique in depositing optical film, TiO2 thin film is deposited on K9 using magnetic filtration DC arc ion plating and its optical property is studied using spectrophotometer and ellipsometer . The results of analyse; Transmissivity is high; Wavelength is between 400~700 nm; Index of refraction is between 2. 3657~2.1082; Optical extinction coefficient is 10-3; Deposition rate is 22. 6 nm/min. The results suggest that magnetic filtration DC arc ion plating could deposite TiO2 thin film with small optical extinction coefficient and good index of refraction which is approximate to that of base material, fast deposttion rate and high target material use ratio. So it has great potential at optical thin film deposition.