A 357.9 nm GaN/AlGaN multiple quantum well ultraviolet laser diode

摘要

Ultraviolet(UV)and deep-UV light emitters are prom-ising for various applications including bioagent detection,wa-ter and air purification,dermatology,high-density optical stor-age,and lithography.However,to achieve shorter UV laser di-odes(LDs),especially for the LDs with lasing wavelength less than 360 nm,requires high AlN mole fraction AlGaN clad-ding layer(CL)and waveguide(WG)layers,which usually leads to generate cracks in AlGaN epilayer due to lack of lat-tice-matched substrates.Meanwhile,due to high resistivity of high AlN mole fraction Mg doped AlGaN layers,only few groups have reported GaN-based LDs with emission wavelength shorter than 360 nm[1−8],and up to now,there is no room temperature continuous-wave(CW)operation UV LDs with a lasing wavelength shorter than 360 nm ever repor-ted.Previously,we have reported a UV LD with lasing wavelength of 366 nm[9].In this paper,a higher AlN mole frac-tion of AlGaN WG layers is employed to shorten the LD emis-sion wavelength to less than 360 nm.A lasing wavelength of 357.9 nm is achieved.