首页> 中文期刊> 《中国物理:英文版》 >Output light power of InGaN-based violet laser diodes improved by using a u-InGaN/GaN/AlGaN multiple upper waveguide

Output light power of InGaN-based violet laser diodes improved by using a u-InGaN/GaN/AlGaN multiple upper waveguide

         

摘要

The upper waveguide (UWG) has direct influences on the optical and electrical characteristics of the violet laser diode (LD) by changing the optical field distribution or barrier of the electron blocking layer (EBL).In this study,a series of InGaN-based violet LDs with different UWGs are investigated systematically with LASTIP software.It is found that the output light power (OLP) under an injecting current of 120 mA or the threshold current (Ith) is deteriorated when the UWG is u-In0.02Gao.98N/GaN or u-In0.02Ga0.98N/AlxGal-xN (0 ≤ x ≤ 0.1),which should be attributed to small optical confinement factor (OCF) or severe electron leakage.Therefore,a new violet LD structure with u-In0.02Ga0.98N /GaN/A10.05Ga0.95N multiple layer UWG is proposed to reduce the optical loss and increase the barrier of EBL.Finally,the output light power under an injecting current of 120 mA is improved to 176.4 mW.

著录项

  • 来源
    《中国物理:英文版》 |2017年第12期|302-306|共5页
  • 作者单位

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123, China;

    Microsystem & Terahertz Research Center, Chinese Academy of Engineering Physics, Chengdu 610200, China;

    Microsystem & Terahertz Research Center, Chinese Academy of Engineering Physics, Chengdu 610200, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing 100049, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

    State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, China;

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