介绍了阴极等离子体电沉积陶瓷涂层的基本原理及其在不同领域中的应用,总结了影响阴极等离子体电沉积陶瓷涂层的因素(包括电压、电流密度、占空比、脉冲频率、主盐浓度、电解液pH、添加剂和实验装置),阐述了阴极等离子体电沉积技术目前存在的问题,展望了其应用前景.%The main mechanism of cathodic plasma electrolytic deposition (CPED) and its applications in different fields were introduced. Some influence factors (including voltage, current density, duty cycle, pulse frequency, main salt concentration, electrolyte pH, additives, and experimental equipment) were summarized. The existing problems of CPED and its future application were discussed.
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