Ni/SiO2 catalyst was prepared for CO methanation using SiO2 treated by dielectric barrier discharge plasma before impregnation. Compared with the conventional Ni/SiO2 catalyst without the treatment, the CO and H2 conversions at 400℃ were both approximately 6% higher for the support-treated catalyst. After the high temperature reaction at 700'C for 6 h, the support-treated catalyst was still more active than conventional Ni/SiO2 catalyst. XRD, TEM and H2-TPR results showed that the support-treated catalyst had smaller Ni particle size and stronger interaction between Ni and SiO2, which confirmed that plasma treatment made SiO2 more favorable for Ni dispersion.%以经介质阻挡放电等离子体处理的SiO2为载体,用浸渍法制备了Ni/SiO2催化剂,并进行了CO甲烷化反应评价.与载体未经处理的常规Ni/SiO2催化剂相比,载体经处理的催化剂在400℃下的CO与H2转化率均提高了约6%,且在经700℃烧结6h后,活性仍高于常规催化剂.XRD、TEM和H2-TPR结果表明,载体经处理的催化剂,Ni颗粒粒径更小、粒径分布更集中,Ni与SiO2之间的相互作用更强,证明等离子体处理使SiO2更有利于促进Ni的分散.
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