在PDP技术中,MgO 的关键作用已经被认识.二次电子的高释放能力,低溅射率和高电阻率使得这个材料适用于PDP 中.然而,在 PDP 的生产过程中,MgO 层将要经受几次在苛刻环境条件下的高温循环.在这个过程中,由于水气和二氧化碳的出现,进入 MgO 而形成污染,这种污染行为已广泛被报道.镁的氢氧化物和镁的碳氧化物都很容易飞溅,会减少平板的寿命,增加放电电压,影响功率消耗;降低透明度,更促使显示效果退化.解决 MgO 杂质的方法是基于应用一些除气作用能比在氧化层上杂物的吸附作用的速度更快的消气剂材料,并提出一个结构适当的吸附消气系统,从开始到整个工作寿命期里进行良好不变的吸附.最后,确定一个在减小 MgO 杂质的吸附结构的效果的模型.%The key role of MgO is well recognized in PDP's technology. In fact, the ability to release a large number of secondary electrons, the low sputtering rate and the high electrical resistance make this material suitable for ensuring good performances of the Plasma Display Panels. However, it is known that during the PDP's manufacturing process, MgO layer should withstand severe thermal cycles in harsh environmen-tal conditions. During such processes, a significant contamination of the oxide, mainly due to moisture and carbon dioxide, occurs: the detrimental action of these gas species on the MgO characteristics has been widely reported in the literature and it will be reviewed in this paper. In particular, both Magnesium hy-droxide and carbonate are easily sputtered, decreasing panel's life; increase discharge voltage, affecting power consumption; loose transparency, thus promoting a degradation of the overall efficiency of the dis-plays. A possible approach trying to reduce the MgO contamination is based on the availability of some ma-terials providing a gettering action able to compete against the impurities sorption speed of the oxide layer.An assessment of a suitable getter configuration is proposed, starting from the basic distinction between gettering action during the process and gettering action during the life. Finally, a modeling of the effect of this getter configuration in reducing MgO contamination is proposed.
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