TiO, thin films were obtained on K9 glass substrates by CK-3 magnetron sputtering system,the deposited temperatures are 150 ℃、200℃ and 250 ℃ respectively. The as-deposited films have no obvious diffraction peaks to be observed and exhibit an amorphous structure from X-ray diffraction (XRD ) patterns. TiOx thin films' optical constants were measured by SENTECH SE 850 Spectral Type Ellipsome ter within the spectral region 300 nm ~ 800 nm. The ellipsometer's experiment data were fitted for Cauchy model. It is found that refractive index (n) and extinction coefficient (k) increase while the substrate temperature increases. When the substrate temperature is increased from 150 X. To 250 X℃,the value of Eg decreased from 3.20 eV to 3. 12 eV.%采用沈阳CK-3高真空磁控溅射薄膜沉积设备在K9玻璃衬底上分别制备了衬底温度为150℃、200℃和250℃的氧化钛薄膜.XRD分析显示这三种温度制备的薄膜由于制备温度不高均没有明显衍射峰,为非晶薄膜.薄膜的光学常数由德国SENTECH SE 850型光谱型椭偏仪对薄膜测试得到,测试波长为300 nm～ 800 nm,采用Cauchy模型对测试结果进行拟合.结果发现随着制备衬底温度的增大,薄膜的折射率n和消光系数k都随着增大.在衬底温度从150℃增大到250℃时,薄膜的光学带隙从3.46 eV减小到3.02 eV.
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