氮化硅陶瓷滚子磁流变、化学与超声复合抛光工艺试验

摘要

为实现氮化硅陶瓷滚子抛光的高效、高精度要求，提出磁流变、化学与超声复合的抛光工艺方法。分析复合抛光的加工机理；利用试验机，在不同工艺参数下进行了复合抛光工艺试验，分析各主要工艺参数对抛光材料去除率和滚子表面粗糙度的影响规律，确定出复合抛光的最佳工艺参数。结果表明：复合抛光后陶瓷滚子表面粗糙度 Ra 由0．3μm 减小至0．03μm；在最佳工艺参数下，滚子能够在保持较高材料去除率的同时获得较好的表面质量；材料去除过程主要是磁流变抛光的剪切作用、超声波抛光的冲击作用以及抛光过程中一系列化学反应综合作用的结果。%In order to realize high efficiency and high precision requirements for polishing of silicon nitride ceramic roll-er,a polishing processing method is presented based on magnetorheological and chemo -ultrasonic compound technolo-gy.The machining mechanism of compound polishing is analyzed,and the compound polishing processing test is car-ried out under different technological parameters.The effects of main technological parameters on removal rate of polis-hing material and surface roughness of rollers are analyzed,and the optimum technological parameters are determined. The results show that the surface roughness of ceramic roller is reduced from 0.3 μm to 0.03 μm after compound polis-hing.The good surface quality and high material removal rate are obtained under the optimum technological parameter. The material removal process is the result of the shear effect of magnetorheological polishing,the impact effect of ultra-sonic polishing,and a series of chemical reactions during polishing process.