首页> 外国专利> POLISHING COMPOUND OF HIGH HARDNESS WHICH IS MAGNETIZABLE FOR A MAGNETORHEOLOGICAL POLISHING PROCESS, CAPABLE OF IMPROVING POLISHING CAPACITY, AND THE POLISHING METHOD THEREOF

POLISHING COMPOUND OF HIGH HARDNESS WHICH IS MAGNETIZABLE FOR A MAGNETORHEOLOGICAL POLISHING PROCESS, CAPABLE OF IMPROVING POLISHING CAPACITY, AND THE POLISHING METHOD THEREOF

机译:磁流变抛光工艺可磁化的高硬度抛光化合物,具有提高抛光能力的能力,及其抛光方法

摘要

PURPOSE: A magnetizable polishing compound of high hardness is provided to uniformly polishing the surface of a processed product by increasing the viscosity of a magnetorheological fluid and magnetizing the polishing compound when the polishing compound is applied to a magnetorheological fluid pad.;CONSTITUTION: A magnetorheological fluid pad(10) includes a polishing compound(11) of high hardness megnetizable for a magnetorheological polishing process. A polishing method using the polishing compound of the high hardness comprises the following steps: molding a magnetorheological fluid into a magnetorheological fluid pad by adding an abrasive to the magnetorheological fluid; positioning the magnetorheological fluid pad on the surface of a product(30) to be processed; sanctioning magnetic field to the magnetorheological fluid pad; and polishing the surface of the product while the magnetorheological fluid pad is rotating.;COPYRIGHT KIPO 2010
机译:目的:提供一种高硬度的可磁化抛光剂,以通过增加磁流变液的粘度并在将抛光剂应用于磁流变液垫上时磁化该抛光剂来均匀地抛光加工产品的表面。;组成:磁流变流体垫(10)包括可磁化的用于磁流变抛光工艺的高硬度抛光剂(11)。使用高硬度抛光剂的抛光方法包括以下步骤:通过向磁流变液中添加磨料,将磁流变液模制成磁流变液垫。将磁流变流体垫放置在要处理的产品(30)的表面上;对磁流变液垫施加磁场;并在磁流变液垫旋转的同时抛光产品的表面。; COPYRIGHT KIPO 2010

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