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POLISHING COMPOUND OF HIGH HARDNESS WHICH IS MAGNETIZABLE FOR A MAGNETORHEOLOGICAL POLISHING PROCESS, CAPABLE OF IMPROVING POLISHING CAPACITY, AND THE POLISHING METHOD THEREOF
POLISHING COMPOUND OF HIGH HARDNESS WHICH IS MAGNETIZABLE FOR A MAGNETORHEOLOGICAL POLISHING PROCESS, CAPABLE OF IMPROVING POLISHING CAPACITY, AND THE POLISHING METHOD THEREOF
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机译:磁流变抛光工艺可磁化的高硬度抛光化合物,具有提高抛光能力的能力,及其抛光方法
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摘要
PURPOSE: A magnetizable polishing compound of high hardness is provided to uniformly polishing the surface of a processed product by increasing the viscosity of a magnetorheological fluid and magnetizing the polishing compound when the polishing compound is applied to a magnetorheological fluid pad.;CONSTITUTION: A magnetorheological fluid pad(10) includes a polishing compound(11) of high hardness megnetizable for a magnetorheological polishing process. A polishing method using the polishing compound of the high hardness comprises the following steps: molding a magnetorheological fluid into a magnetorheological fluid pad by adding an abrasive to the magnetorheological fluid; positioning the magnetorheological fluid pad on the surface of a product(30) to be processed; sanctioning magnetic field to the magnetorheological fluid pad; and polishing the surface of the product while the magnetorheological fluid pad is rotating.;COPYRIGHT KIPO 2010
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