基于电化学腐蚀法的钨探针制备装置研究

摘要

A tungsten probe fabrication device is proposed based on electrochemical etching method and the parameter of fabricating tungsten probe is researched.The experimental part can be used to adjust the relative position and motion parameters of the probe and the electrolyzer.The control part can be used to control and record the state of electrochemical etching.Compared with traditional fabrication device,the present device ensured to fabricate large length-to-width ratio tip by controlling the motion of tungsten probe,meanwhile,the radius of tips can be precisely controlled within 5 ～ 20 nm by controlling the etching time.%基于电化学腐蚀法制备钨探针的原理,设计了一套钨探针制备装置,并对钨探针制备参数进行了研究.装置的实验部分用于调整探针与电解槽的相对位置和运动参数,控制部分用于监测、控制并记录电化学反应的状态.与传统腐蚀探针相比,该装置通过控制电路控制探针腐蚀过程中运动参数,获得了形状可控的大长径比探针;同时通过精确控制腐蚀反应时间,可制备针尖曲率半径范围为5 ～ 20 nm的探针.