首页> 外文学位 >Oblique pumping, resonance saturation, and spin wave instability processes in thin Permalloy films.
【24h】

Oblique pumping, resonance saturation, and spin wave instability processes in thin Permalloy films.

机译:坡莫合金薄膜中的倾斜泵浦,共振饱和和自旋波不稳定性过程。

获取原文
获取原文并翻译 | 示例

摘要

The study of nonlinear dynamics in metal films is of increasing importance as advancements are made in magnetic recording. In this dissertation, these interactions are examined by the study of first order spin wave instability (SWI) processes that occur for external static magnetic fields well below ferromagnetic resonance (FMR), and second order SWI processes that occur for static fields over the full FMR field range. This work is concerned specifically with the study of the high power resonance saturation and oblique pumping responses in thin Permalloy films, the microwave threshold amplitudes at which the instabilities occur, and the theoretical analysis of the relevant SWI processes.;To greatly increase measurement accuracy and reduce measurement time, the high power FMR system has been modified and new calibration techniques implemented. The modifications to the system allow for fully automated and calibrated microwave threshold amplitude vs. static field measurements, termed butterfly curves.;Resonance saturation butterfly curves have been measured for an in-plane field configuration for 35 - 123 nm thin Permalloy films. The butterfly curves show a jump on the low field side associated with a low field shift of the FMR profile and a foldover like asymmetry development. Apart from the jump, the second order Suhl SWI theory, suitably modified for thin films, provides good fits to the butterfly curve data through the use of constant spin wave relaxation rates that are on the same order as expected for intrinsic magnon-electron scattering processes. The FMR in-plane precession cone angles at threshold are small.;Oblique pumping butterfly curves have been measured at different in-plane field configurations for 104 and 123 nm thin Permalloy films. The butterfly curves show thickness dependent high field cutoffs that agree with the field points at which the bottom of the spin wave band moves above one half the pump frequency. A combination of parallel and perpendicular first order SWI theory, suitably modified for thin films, shows good fits to the data except at low fields where the thin film approximation is not applicable. The damping trial functions used for the fits correspond to magnon-electron and three-magnon scattering processes.
机译:随着磁记录技术的进步,对金属膜非线性动力学的研究越来越重要。本文通过对远低于铁磁共振(FMR)的外部静磁场发生的一阶自旋波不稳定性(SWI)过程以及对于整个FMR范围内的静磁场进行的二阶SWI过程进行研究,研究了这些相互作用。字段范围。这项工作特别涉及研究坡莫合金薄膜中的高功率共振饱和和倾斜泵浦响应,发生不稳定性的微波阈值幅度以及相关SWI过程的理论分析。为了减少测量时间,高功率FMR系统已经过修改,并采用了新的校准技术。对系统的修改允许进行全自动和校准的微波阈值幅度与静态场的测量,称为蝶形曲线。已针对35-123 nm薄坡莫合金薄膜的面内场配置测量了共振饱和蝶形曲线。蝶形曲线显示了低场侧的跳跃,这与FMR轮廓的低场偏移和像不对称性发展一样的折叠有关。除了跳跃以外,通过修改薄膜的二阶Suhl SWI理论,通过使用恒定的自旋波弛豫率与固有磁振子电子散射过程所预期的阶数相同,可以很好地拟合蝶形曲线数据。 。阈值处的FMR面内进动锥角很小。在104和123 nm的坡莫合金薄膜上,已在不同的面内场配置下测量了Oblique泵浦蝶形曲线。蝶形曲线显示出取决于厚度的高场截止点,该场截止点与自旋波带的底部移动到泵浦频率的一半以上的场点一致。平行和垂直一阶SWI理论的组合,对薄膜进行了适当的修改,显示出与数据的良好拟合,但在不适用薄膜近似的低场下除外。用于拟合的阻尼试验功能对应于马格诺电子和三马格诺散射过程。

著录项

  • 作者

    Olson, Heidi M.;

  • 作者单位

    Colorado State University.;

  • 授予单位 Colorado State University.;
  • 学科 Physics Electricity and Magnetism.;Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 203 p.
  • 总页数 203
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 电磁学、电动力学;工程材料学;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号