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Development of a nitrogen incorporated ultrananocrystalline diamond film based field emitter array for a flat panel X-ray source.

机译:用于平板X射线源的掺氮超纳米晶金刚石膜基场发射器阵列的开发。

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摘要

As an alternative to conventional X-ray sources, a flat panel transmission X-ray source is being developed. A field emitter array (FEA) prototype to be incorporated as cold cathode in this flat panel X-ray source was fabricated for this work. Using the Particle-in-Cell code OOPIC Pro, an initial FEA was designed through simulations. Based on the simulation results, a FEA prototype was fabricated using conventional microfabrication techniques. Planar nitrogen-incorporated ultrananocrystalline diamond (N-UNCD) films were used as field emitters. This N-UNCD based FEA prototype was composed of 9 pixels distributed in a 3x3 array, with a pixel size of 225x225 mum, and a 500 mum pitch. Each pixel was composed of a N-UNCD-based cathode and a free-standing copper grid used as extraction grid. Field emission from each pixel could be addressed individually. Emission currents per pixel in the order of 0.05 - 3.0 muA were obtained for extraction fields between 4 and 20 V/mum. Delamination issues were found in the microfabrication of the first FEA prototype. Consequently, a second generation N-UNCD based 3x3 FEA was designed and fabricated. In this design, the free-standing grid was replaced by a tungsten layer composed of a matrix of 11x11 extraction gates. Each extraction gate had a circular aperture of 6 mum in diameter. These design changes solved the delamination issues found for the first prototype. Also, for an extraction field of 7 V/mum, an emission current around 0.14 muA per pixel was measured; this value is higher than the 0.08 muA per pixel obtained from the initial FEA prototype at the same extraction field.
机译:作为常规X射线源的替代,正在开发平板透射X射线源。为此工作,制造了要作为冷阴极并入此平板X射线源的场发射器阵列(FEA)原型。使用单元内粒子代码OOPIC Pro,通过仿真设计了初始FEA。根据仿真结果,使用常规微加工技术制造了FEA原型。掺氮的平面超纳米晶金刚石(N-UNCD)薄膜用作场发射器。这个基于N-UNCD的FEA原型由3个3x3阵列中分布的9个像素组成,像素大小为225x225微米,间距为500微米。每个像素由一个基于N-UNCD的阴极和一个用作萃取栅的独立式铜栅组成。每个像素的场发射可以单独解决。对于4至20 V / mum的提取场,获得的每个像素的发射电流约为0.05-3.0μA。在第一个FEA原型的微加工中发现了分层问题。因此,设计并制造了第二代基于N-UNCD的3x3 FEA。在这种设计中,独立式栅格被由11x11抽气门矩阵组成的钨层代替。每个抽气门的直径为6毫米的圆形孔。这些设计更改解决了第一个原型的分层问题。此外,对于7 V / mum的提取场,测得的发射电流约为每个像素0.14μA。该值高于在相同提取场从初始FEA原型获得的每像素0.08μA。

著录项

  • 作者单位

    Missouri University of Science and Technology.;

  • 授予单位 Missouri University of Science and Technology.;
  • 学科 Nanotechnology.;Nuclear engineering.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 137 p.
  • 总页数 137
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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