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The electron transport within the wide energy gap compound semiconductors gallium nitride and zinc oxide.

机译:宽能隙内的电子传输使半导体镓和氧化锌复合。

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摘要

In this thesis, the electron transport that occurs within two wide energy gap semiconductors, gallium nitride and zinc oxide, is considered. Electron transport within gallium arsenide is also examined, albeit primarily for benchmarking purposes. The over-arching goal of this thesis is to provide the materials community with tools for analysis and optimization to be used when evaluating the consequences of transient electron transport within these compound semiconductors. Providing fresh insights into the character of the electron transport within zinc oxide, with particular focus on the device implications, is another aim of this analysis.;Initially, Monte Carlo electron transport simulation results are used for a comparative analysis of the transient electron transport that occurs within bulk zinc-blende gallium arsenide and bulk wurtzite gallium nitride. It is found that for both materials the electron drift velocity and the average electron energy field-dependent "settling times" are strongly correlated and that the electric field resulting in the shortest electron transit-time is a function of channel length. Then, the applicability of the semi-analytical approach of Shur in evaluating the transient electron transport response within gallium arsenide, gallium nitride, and zinc oxide is critically examined. In particular, a comparison with Monte Carlo results is performed in order to establish the utility of this approach as a tool in studying the transient electron transport response. Next, a Monte Carlo analysis of the electron transport within bulk wurtzite zinc oxide is performed. The applied electric field strength that ensures the minimum electron time-to-transit across a given channel length is determined. These results are then used in order to provide an upper bound on the potential performance of zinc oxide based devices.;Finally, the utility of the semi-analytical approach of Shur, for the purposes of device design optimization, is considered for the specific case of bulk wurtzite ZnO. It is found that the results produced through the semi-analytical approach of Shur are, in many cases, imperceptibly different from those of the Monte Carlo simulations. This adds to the allure of the semi-analytical approach as a versatile tool for transient electron transport analyzes and device design.
机译:本文考虑了在氮化镓和氧化锌这两个宽能隙半导体中发生的电子传输。还检查了砷化镓中的电子传输,尽管主要是为了进行基准测试。本文的总体目标是为材料界提供分析和优化工具,以评估这些化合物半导体中瞬态电子传输的后果。本分析的另一个目的是提供新的见解,以了解氧化锌中电子传输的特性,特别着重于器件的含义。;最初,蒙特卡洛电子传输仿真结果用于瞬态电子传输的比较分析,发生在块状闪锌矿砷化镓和块状纤锌矿氮化镓中。发现对于这两种材料,电子漂移速度和平均电子能量场相关的“稳定时间”密切相关,并且导致最短电子传输时间的电场是沟道长度的函数。然后,严格地研究了Shur的半分析方法在评估砷化镓,氮化镓和氧化锌中的瞬态电子传输响应时的适用性。特别地,与蒙特卡洛结果进行比较,以建立该方法作为研究瞬态电子传输响应的工具的效用。接下来,对块状纤锌矿型氧化锌内的电子传输进行了蒙特卡洛分析。确定所施加的电场强度,该电场强度可确保在给定的通道长度范围内最小的电子渡越时间。然后使用这些结果来提供基于氧化锌的器件的潜在性能的上限。最后,针对特定的器件,考虑到Shur的半分析方法的效用,以优化器件设计。块纤锌矿ZnO。结果发现,在许多情况下,通过Shur的半分析方法得出的结果与蒙特卡洛模拟的结果在许多方面没有明显的不同。作为瞬态电子传输分析和器件设计的通用工具,这增加了半分析方法的吸引力。

著录项

  • 作者

    Abdul Hadi, Walid.;

  • 作者单位

    University of Windsor (Canada).;

  • 授予单位 University of Windsor (Canada).;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 177 p.
  • 总页数 177
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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