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Fluxless Bonding Processes Using Silver-Indium System for High Temperature Electronics and Silver Flip-Chip Interconnect Technology.

机译:使用用于高温电子学的银-铟系统和银倒装芯片互连技术的无助焊工艺。

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摘要

In this dissertation, fluxless silver (Ag)-indium (In) binary system bonding and Ag solid-state bonding are used between different bonded pairs which have large thermal expansion coefficient (CTE) mismatch and flip-chip interconnect bonding application. In contrast to the conventional soldering process, fluxless bonding technique eliminates contamination and reliability problems caused by flux to fabricate high quality joints. There are two section are reported. In the first section, the reactions of Ag-In binary system are presented. In the second section, the high melting temperature, thermal and electrical conductivity joint materials bonding by either Ag-In binary system bonding or solid-state bonding processes for different bonded pairs and flip-chip application are designed, developed, and reported.;Our group have studied Ag-In system for several years and developed the bonding processes successfully. However, the detailed reactions of Ag and In were seldom studied. To design a proper bonding structure, it is necessary to understand the reaction between Ag and In. The systematic experiments were performed to investigate these reactions. A 40 um Ag layer was electroplated on copper (Cu) substrates, followed by indium layers of 1, 3, 5, 10, and 15 um, respectively. The samples were annealed at 180 °C in 0.1 torr vacuum. For samples with In thickness less than 5 mum, the joint compositions are Ag2In only (1 um) or AgIn2, Ag2In, and Ag solid solution (Ag) after annealing. No indium is identified. For 10 and 15 um thick In samples, In covers almost over the entire sample surface after annealing. Later, an Ag layer was annealed at 450 °C for 3 hours to grow Ag grains, followed by plating 10 um In and annealing at 180 °C. By annealing Ag before plating In, more In is kept in the structure during annealing at 180 °C. Based on above results, for those designs with In thinner than 5 um, the Ag layer needs to be annealed, prior to In plating in order to make a successful bonding.;In this section, we further studied the Ag-In bonding and solid-state bonding for different bonded pairs and flip-chip application. For the silicon (Si) and aluminum (Al) pair, Al has been used as the material for interconnect pads on the ICs. However, its high CTE (23 x 10-6/°C) and non-solderable property limit its applications in electronic products. To overcome these problems, a fluxless Ag-In bonding was developed. Al was deposited Cr/Cu layer on the surface by E-beam evaporator to make it solderable. 15 um of Ag and 8 um of In were sequentially plated on the Al substrates and 15 um of Ag was on Si chips with Cr/Au coating layer. The bonding was performed at 180 °C in 0.1 torr vacuum. The joint consists of Ag/(Ag)/Ag2In/(Ag)/Ag. The joint can achieve a solidus temperature of beyond 600 °C. From shear test results, the shear strengths far exceed the requirement in MIL-STD-883H. Al is not considered as a favorable substrate material because it is not solderable and has a high CTE. The new method presented in this thesis seems to have surmounted these two challenges.;Since Ag2In is weak inside the joint in Ag-In system, an annealed process was used to convert the joints into Ag solid solution (Ag) to increase the joint strength and ductility. Two copper (Cu) substrates were bonded at 180 °C without flux. Bonding samples were annealed at 200 °C for 1,000 hours (first design) and at 250 °C for 350 hours (second design), respectively. Scanning electron microscope with energy dispersive X-ray (EDX) analysis results indicate that the joint of the first design is an alloy of mostly (Ag) with micron-size Ag2In and Ag3In regions, and that of second design has converted to a single (Ag) phase. Shear test results show that the breaking forces far exceed the requirement in MIL-STD-883H. The joint solidus temperatures are 600 °C and 800 °C for the first and second designs, respectively. The research results have shown that high-strength and high temperature joints can be manufactured using fluxless low temperature processes with the Ag-In system and are valuable in developing high temperature package. (Abstract shortened by UMI.).
机译:本文在热膨胀系数(CTE)不匹配和倒装芯片互连应用中的不同键对之间采用无助熔银(Ag)-铟(In)二元体系键合和Ag固态键合。与传统的焊接工艺相比,无助焊剂技术消除了由助焊剂制造高质量接头引起的污染和可靠性问题。有两节报道。在第一部分中,介绍了Ag-In二元体系的反应。在第二部分中,设计,开发和报告了通过Ag-In二元体系键合或固态键合工艺对不同键合对和倒装芯片应用进行的高熔点,高导热和导电接头材料的键合。该小组已经研究了Ag-In系统多年,并成功开发了键合工艺。但是,很少研究Ag和In的详细反应。为了设计合适的键合结构,必须了解Ag和In之间的反应。进行系统的实验以研究这些反应。在铜(Cu)基板上电镀40 um的Ag层,然后分别镀上1、3、5、10和15 um的铟层。将样品在0.1托真空中于180°C退火。对于In厚度小于5微米的样品,退火后的接头成分仅为Ag2In(1 um)或AgIn2,Ag2In和Ag固溶体(Ag)。没有发现铟。对于10和15 um厚的In样品,退火后In几乎覆盖了整个样品表面。随后,将Ag层在450°C下退火3小时以生长Ag晶粒,然后镀10 um In并在180°C下退火。通过在镀In前对Ag进行退火,可以在180°C的退火过程中在结构中保留更多的In。根据以上结果,对于那些In厚度小于5 um的设计,需要先进行Ag层退火,然后再进行In电镀,以便成功进行键合。在本节中,我们将进一步研究Ag-In键合和固相状态键合用于不同的键合对和倒装芯片应用。对于硅(Si)和铝(Al)对,Al已用作IC上互连焊盘的材料。但是,其较高的CTE(23 x 10-6 /°C)和不可焊接的特性限制了其在电子产品中的应用。为了克服这些问题,开发了无助熔剂的Ag-In键合。通过电子束蒸发器在表面上沉积了Cr / Cu层以使其可焊接。将15 um的Ag和8 um的In依次镀在Al基板上,并将15 um的Ag镀在具有Cr / Au涂层的Si芯片上。在180℃,0.1托真空下进行粘合。关节由Ag /(Ag)/ Ag2In /(Ag)/ Ag组成。接头的固相线温度可超过600°C。从剪切测试结果来看,剪切强度远远超过了MIL-STD-883H的要求。 Al不被认为是良好的基板材料,因为它不可焊接且具有高的CTE。本文提出的新方法似乎克服了这两个挑战:由于Ag-In系统的接头内部Ag2In较弱,因此采用退火工艺将接头转变为Ag固溶体(Ag)以提高接头强度。和延展性。两个铜(Cu)基板在无焊剂的情况下于180°C粘合。粘合样品分别在200°C退火1000小时(第一种设计)和250°C退火350小时(第二种设计)。扫描电子显微镜的能量色散X射线(EDX)分析结果表明,第一种设计的接头主要是(Ag)的微米尺寸Ag2In和Ag3In区域的合金,而第二种设计的接头已转变为单一的( Ag)相。剪切试验结果表明,断裂力远远超过了MIL-STD-883H的要求。第一种和第二种设计的联合固相线温度分别为600°C和800°C。研究结果表明,可以使用无熔剂低温工艺和Ag-In系统来制造高强度和高温接头,这对于开发高温封装非常有价值。 (摘要由UMI缩短。)。

著录项

  • 作者

    Wu, Yuan-Yun.;

  • 作者单位

    University of California, Irvine.;

  • 授予单位 University of California, Irvine.;
  • 学科 Engineering Materials Science.;Engineering Packaging.;Engineering Computer.
  • 学位 Ph.D.
  • 年度 2015
  • 页码 180 p.
  • 总页数 180
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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