Modeling of optical alignment and metrology in VLSI manufacturing.

摘要

The object of this thesis is to develop rigorous models to simulate optical images of semiconductor structures detected by various optical alignment and metrology schemes. Two specific areas we chose to study are optical alignment for mask and wafer, and optical metrology for line-width measurement. Theoretical and experimental verification efforts have been made to demonstrate the validity of the models developed. A simulator based on these models has been implemented to study various aspects of alignment and metrology problems.