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Growth and characterization of low-temperature grown gallium arsenide and resonant cavity structures

机译:低温生长的砷化镓及其共振腔结构的生长和表征

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摘要

There is a need for photodiodes which can operate at high speeds (30 GHz or more) and at high efficiencies (greater than 70%). These photodiodes can be used as receivers in communication networks which use fiber-optic links for long distance transmission. We studied several novel photodiodes, including a structure which is capable of detecting two wavelengths. These devices were optimized for performance in terms of intrinsic speed and device efficiency. We used a resonant cavity structure which employing a thin absorption region between two mirrors. The cavity and mirrors were designed for optimal efficiency at an operating wavelength. The thin absorption region ensures that the device is not transit time limited, which results in a high speed of operation.;Low-temperature grown GaAs has some interesting material properties which make it useful for a variety of device applications. The high resistivity of this material makes it an excellent choice as an isolation buffer region. This material also exhibits photoresponse to sub-bandgap illumination. Although the absorption efficiency of this layer to sub-bandgap photons is low (less than 2%), we have studied ways to optimize the photoresponse of this material using growth variables and resonant cavity structures. The photoresponse behavior of the material when alloyed with In was also studied as a function of InGaAs alloy concentration. All these studies helped us in understanding some of the basic physics of the low-temperature grown GaAs.
机译:需要能够以高速(30 GHz或更高)和高效率(大于70%)工作的光电二极管。这些光电二极管可用作通信网络中的接收器,该通信网络使用光纤链路进行长距离传输。我们研究了几种新颖的光电二极管,包括能够检测两个波长的结构。这些设备针对固有速度和设备效率进行了性能优化。我们使用了谐振腔结构,该结构在两个反射镜之间采用了薄的吸收区。腔和反射镜的设计旨在在工作波长下实现最佳效率。薄的吸收区确保器件不受传输时间的限制,从而提高了操作速度。低温生长的GaAs具有一些有趣的材料特性,使其可用于多种器件应用。这种材料的高电阻率使其成为隔离缓冲区的绝佳选择。该材料还表现出对亚带隙照明的光响应。尽管该层对次带隙光子的吸收效率很低(小于2%),但我们已经研究了使用生长变量和谐振腔结构来优化这种材料的光响应的方法。还研究了与In合金化时材料的光响应行为与InGaAs合金浓度的关系。所有这些研究帮助我们理解了低温生长的砷化镓的一些基本物理原理。

著录项

  • 作者

    Srinivasan, Anand.;

  • 作者单位

    The University of Texas at Austin.;

  • 授予单位 The University of Texas at Austin.;
  • 学科 Materials science.;Electrical engineering.
  • 学位 Ph.D.
  • 年度 1995
  • 页码 126 p.
  • 总页数 126
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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