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Photoluminescence properties of erbium-doped III-V semiconductors.

机译:掺III III-V半导体的光致发光特性。

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The photoluminescence properties of erbium doped GaAs and GaP epitaxial layers grown by metal-organic vapor phase epitaxy (MOVPE) were investigated. Rare-earth doped semiconductors are of interest because of their potential use in optoelectronic devices which combine sharp rare-earth luminescence with the convenience of electrical excitation via the semiconductor host. One desirable feature of rare-earth luminescence is that the emission wavelength shows exceptional stability against changes in temperature. Optical devices made from erbium doped materials are of particular interest because the I13/2 4→I4 15/2Er 3+ emission at 1.54 mum matches the minimum loss region of silica fibers used in optical communications.;Relationships between the growth conditions and the optical, electrical, and physical properties of erbium doped GaAs and GaP were examined. A detailed analysis of the I13/2 4→I4 15/2Er 3+ emission indicated that different erbium source molecules or semiconductor hosts led to the incorporation of several different types of Er3+ centers. The interaction with unintentional oxygen impurities proved to be especially important, leading to the creation of Er-O complexes which showed exceptionally strong, sharp luminescence. In GaAs, these emissions were associated with the efficient Er-2O center. Possible incorporation mechanisms for the Er-2O center were given. In GaP, sharp emissions were proposed to originate from a well-defined Er3+ center with local bonding similar to erbium gallium garnets.;The fundamental energy transfer mechanisms between the rare-earth ion and semiconductor host were also investigated. The characteristics of thermally activated quenching processes were examined by modeling the temperature dependence of the Er3+ emission intensity and decay lifetime. These results were used in conjunction with high pressure photoluminescence experiments to identify the two dominant processes responsible for strong quenching of the Er3+ emission at high temperature. Additionally, the interaction between Er3+ centers and free carriers was shown to be important to excitation and quenching of the Er-2O center in GaAs. The Er3+ emission was greatly reduced in n-type samples, whereas the emission remained strong in p-type samples. A model based on the results of a two-beam experiment indicated the presence of a strong Auger quenching mechanism involving free electrons.
机译:研究了金属有机气相外延(MOVPE)生长的掺pedGaAs和GaP外延层的光致发光特性。稀土掺杂的半导体之所以引起人们的关注,是因为它们在光电器件中的潜在用途,这些器件将稀土元素的发光与通过半导体主体进行电激发的便利结合在一起。稀土发光的一个理想特征是发射波长显示出对温度变化的出色稳定性。由掺do材料制成的光学器件特别受关注,因为1.53微米处的I13 / 2 4→I4 15 / 2Er 3+发射与光通信中使用的石英纤维的最小损耗区域相匹配;生长条件与光学器件之间的关系,掺杂do的GaAs和GaP的电学和物理性能已得到检验。对I13 / 2 4→I4 15 / 2Er 3+发射的详细分析表明,不同的源分子或半导体主体导致掺入了几种不同类型的Er3 +中心。事实证明,与无意识的氧杂质的相互作用特别重要,从而导致了Er-O络合物的产生,该络合物显示出异常强的,强烈的发光。在砷化镓中,这些排放与高效的Er-2O中心有关。给出了Er-2O中心可能的掺入机制。在GaP中,有人提出了由定义明确的Er3 +中心发出的剧烈发射,该中心具有类似于镓石榴石的局部键合;并研究了稀土离子与半导体主体之间的基本能量传递机理。通过对Er3 +发射强度和衰变寿命的温度依赖性进行建模,可以检查热活化淬火过程的特征。这些结果与高压光致发光实验一起使用,以确定高温下Er3 +发射强烈淬灭的两个主要过程。此外,Er3 +中心与自由载流子之间的相互作用被证明对于GaAs中Er-2O中心的激发和猝灭很重要。在n型样品中,Er3 +的发射大大降低,而在p型样品中,发射仍然很强。基于两束实验结果的模型表明存在涉及自由电子的强俄歇淬灭机理。

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