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Modeling, simulation and design of EOS/ESD protection devices and circuits in silicon-on-insulator technology.

机译:绝缘体上硅技术中的EOS / ESD保护器件和电路的建模,仿真和设计。

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摘要

Silicon On Insulator (SOI) technology is an ideal candidate for low-voltage electronics and has a number of advantages over bulk-Si technology in speed, processing costs, area, latchup, etc. However, devices used for providing protection against Electrical Overstress (EOS) and Electrostatic Discharges (ESD) are weaker in SOI technology. Electrical overstress and electrostatic discharges are major causes for integrated circuit (IC) field failures. Industry surveys indicate that nearly 50% of all IC field failures can be attributed to EOS/ESD events. Therefore, the aim of this thesis is to model the electrical and thermal characteristics of SOI protection devices and be able to simulate protection circuits under ESD stresses.; Because thermal failure is one of the most prevalent failure mechanisms during a Human Body Model (HBM) ESD stress, we first address the dynamics of heat flow in SOI devices. Power-to-failure versus time-to-failure profiles for SOI protection devices are generated through a consideration of Joule heating. Experimental results are presented to justify assumptions made in the investigation of heat flow in SOI devices. A lossy transmission line equivalent model has been used to model the heat diffusion problem. A design space for multifinger NMOS protection devices has been developed on the basis of self-heating constraints. The method of images has been used to transform the multifinger device to an equivalent single-finger device to simplify the heat-flow analysis.; During pulsed stressing of SOI MOSFETs for ESD characterization, the turn-on voltage of the parasitic bipolar transistor was observed to be a function of the stress pulse-width. This observation can be understood in terms of a capacitive charging model. The theory behind this time-dependent snapback is presented in this thesis along with the experimental results. Various novel protection structures and compact protection schemes have been suggested using the time dependence of BJT triggering voltage.; For the first time, a circuit level simulation tool for CMOS-on-SOI ESD protection networks is presented. The simulator, SOI-iETSIM, has built-in device models for completely coupled electrothermal simulation of SOI protection devices operating in the high current regime. The implementation of thermal models in a circuit level simulator for SOI circuits is discussed. Modeling the floating body effects in SOI MOSFETs and their effect on the device operation in the snapback mode is also discussed. The implementation of the parasitic BJT in the SOI MOSFET model is different from previously published models. Device simulation examples and an SOI-ESD protection circuit simulation example are also presented.
机译:绝缘体上硅(SOI)技术是低压电子设备的理想选择,并且在速度,处理成本,面积,闩锁等方面,与体硅技术相比,它具有许多优势。但是,用于提供抗电过载保护的设备( EOS和静电放电(ESD)在SOI技术中较弱。电气过应力和静电放电是集成电路(IC)现场故障的主要原因。行业调查表明,几乎所有IC现场故障的50%都可归因于EOS / ESD事件。因此,本文的目的是对SOI保护器件的电气和热特性进行建模,并能够模拟ESD应力下的保护电路。由于热失效是人体模型(HBM)ESD应力期间最普遍的失效机制之一,因此我们首先解决SOI器件中热流的动力学问题。通过考虑焦耳热来生成SOI保护设备的停电与停电时间曲线。提出了实验结果以证明在研究SOI器件中的热流时所作的假设是正确的。有损传输线等效模型已用于对热扩散问题进行建模。基于自发热约束,已经开发了用于多指NMOS保护器件的设计空间。图像方法已用于将多指设备转换为等效的单指设备,以简化热流分析。在对SOI MOSFET进行脉冲应力化以进行ESD表征时,观察到寄生双极晶体管的导通电压是应力脉冲宽度的函数。可以根据电容性充电模型来理解该观察结果。本文介绍了这种随时间变化的快照的背后的理论以及实验结果。利用BJT触发电压的时间依赖性,已经提出了各种新颖的保护结构和紧凑的保护方案。首次展示了用于SOI上的CMOS ESD保护网络的电路级仿真工具。模拟器SOI-iETSIM具有内置的设备模型,可对在大电流条件下工作的SOI保护设备进行完全耦合的电热模拟。讨论了热模型在SOI电路的电路级模拟器中的实现。还讨论了对SOI MOSFET中的浮体效应建模及其对快速恢复模式下器件操作的影响的模型。 SOI MOSFET模型中寄生BJT的实现与先前发布的模型不同。还给出了器件仿真示例和SOI-ESD保护电路仿真示例。

著录项

  • 作者

    Raha, Prasun Kumar.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1998
  • 页码 107 p.
  • 总页数 107
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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