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Time domain terahertz spectroscopy of semiconductor bulk and multiple quantum wells structures.

机译:半导体本体和多量子阱结构的时域太赫兹光谱。

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摘要

A time-domain terahertz spectroscopic system with high source power (average power > 10 nW) and high signal-to-noise ratio (>104) was developed and used to study ultrafast electronic processes in semiconductor structures. The physics of the spectroscopy, the theoretical basis of the interferometry, the model of the electron-electromagnetic field interaction, and the principle of experimental data processing are presented.; The first direct measurement of the intervalley scattering time in In 0.53Ga0.47As was performed. The intervalley scattering time constants obtained were tauLGamma = 35 fs and tauLGamma = 450 fs. The spectroscopic data showed that at low carrier density the carrier-carrier scattering is unimportant. The intervalley deformation potential was obtained from the measured intervalley scattering time constant tau LGamma. The transient conductivity was obtained using time-domain terahertz spectroscopy. The frequency dependent terahertz spectroscopy enabled us to uniquely determine the transient mobility and density. The transient electron mobility is ∼5200 cm2/Vs, which is less than the Hall mobility. For large photocarrier densities, this discrepancy is attributed to the additional momentum relaxation associated with electron-hole scattering.; Using pump pulses with wavelength of 810 run, the electron trapping time in low-temperature-grown GaAs was accurately determined. The measured trapping time is slightly larger than that observed from a band-edge pump-probe measurements. We argue that the terahertz technique provides the most reliable measure of carrier lifetime due to the unique interaction.; The carrier dynamics of low-temperature-grown InGaAs bulk and InGaAs/InAlAs multiple quantum wells were investigated. We were able to differentiate the two dominant mechanisms in the electron decay process, trapping and recombination. A trapping time as fast as 1.3--2.6 ps was observed for photo-excited electrons. The effects of Be-doping and growth temperature on the trapping dynamics in both bulk and multiquantum wells were determined. The role of Be-As complexes and simple compensation were discussed. The photo-electron trapping time of isolated As defects was found to be 16--24 ps. Annealing of low-temperature-grown materials was found to dramatically decrease the recombination time of isolated As defects but hardly changed the effective trapping rate. We propose that the isolated As defects still play a major role in carrier trapping and recombination in the annealed low-temperature-grown InGaAs multi-quantum wells. However, the formation of As precipitates after annealing may dramatically decrease the recombination time of isolated As defects. The initial transient conductivity and the residual conductivity were determined using numerical methods in a quasi-static fashion. The mobility mu and the static carrier density No are uniquely determined. This allows us to calculate the initial change of the conductivity Deltasigma i due to photoexcitation. A significant residual (t > 10ns) photoconductivity has been observed in low-temperature-grown InGaAs. This residual conductivity has significant consequences for device performance. Be-doping was shown to systematically reduce the residual conductivity and simultaneously reduce the decay time of the initial conductivity transient. The Be related defect may act in the form of a Be-As complex which may be a superior recombination center. However, it is not possible to disregard the compensation effects of the beryllium.; The carrier density and mobility of a GaN sample were determined using static terahertz spectroscopy. Assuming the carrier density and mobility are independent parameters, the terahertz transmission through a multi-layer structure was calculated and shown to fit the experimental data. The values of carrier density and mobility obtained in the fitting are consistent with the Hall measurement results.; A wide well-width GaAs-AlGaAs multi-quantum well
机译:开发了具有高源功率(平均功率> 10 nW)和高信噪比(> 104)的时域太赫兹光谱系统,并将其用于研究半导体结构中的超快电子过程。介绍了光谱学的物理学,干涉测量的理论基础,电子-电磁场相互作用的模型以及实验数据处理的原理。首次直接测量了In 0.53Ga0.47As中的区间散射时间。获得的区间间隔散射时间常数为tauLGamma = 35 fs和tauLGamma = 450 fs。光谱数据表明,在低载流子密度下,载流子-载流子散射并不重要。从测得的间隔散射时间常数tau LGamma获得间隔变形的潜力。使用时域太赫兹光谱法获得瞬态电导率。频率相关的太赫兹光谱使我们能够唯一确定瞬态迁移率和密度。瞬态电子迁移率约为5200 cm2 / Vs,小于霍尔迁移率。对于较大的光载流子密度,该差异归因于与电子-空穴散射有关的额外动量松弛。使用波长为810nm的泵浦脉冲,可以精确确定低温生长的GaAs中的电子俘获时间。测得的捕获时间略大于从带边泵浦探针测量中观察到的捕获时间。我们认为,由于独特的相互作用,太赫兹技术提供了最可靠的载流子寿命度量。研究了低温生长的InGaAs本体和InGaAs / InAlAs多量子阱的载流子动力学。我们能够区分电子衰变过程中的两个主要机理,即俘获和复合。光激发电子的捕获时间快至1.3--2.6 ps。确定了Be掺杂和生长温度对大量和多量子阱中俘获动力学的影响。讨论了Be-As配合物和简单补偿的作用。发现孤立的As缺陷的光电子俘获时间为16--24ps。发现低温生长材料的退火可以显着减少分离的As缺陷的重组时间,但几乎不会改变有效捕获率。我们建议,在退火的低温生长的InGaAs多量子阱中,分离出的As缺陷仍然在载流子捕获和重组中起主要作用。但是,退火后形成的As沉淀可显着减少孤立的As缺陷的重组时间。使用数值方法以准静态方式确定了初始瞬态电导率和残余电导率。迁移率μ和静态载流子密度No是唯一确定的。这使我们能够计算由于光激发引起的电导率Deltasigma i的初始变化。在低温生长的InGaAs中观察到了显着的残余(t> 10ns)光电导性。这种残留的电导率会对器件性能产生重大影响。研究表明,掺杂可以系统地降低残留电导率,同时减少初始电导率瞬态的衰减时间。与Be有关的缺陷可以Be-As复合物的形式起作用,其可以是优良的重组中心。但是,不可能忽略铍的补偿作用。使用静态太赫兹光谱法确定GaN样品的载流子密度和迁移率。假设载流子密度和迁移率是独立的参数,则计算了通过多层结构的太赫兹传输,并显示出适合实验数据。拟合中获得的载流子密度和迁移率值与霍尔测量结果一致。宽阱宽GaAs-AlGaAs多量子阱

著录项

  • 作者

    Chen, Yue.;

  • 作者单位

    Emory University.;

  • 授予单位 Emory University.;
  • 学科 Physics Condensed Matter.; Physics Optics.
  • 学位 Ph.D.
  • 年度 1998
  • 页码 145 p.
  • 总页数 145
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;
  • 关键词

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