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Multimillion atom molecular dynamics simulations of adhesion and nanoindentation of silicon nitride.

机译:氮化硅的附着力和纳米压痕的数百万个原子分子动力学模拟。

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摘要

Multi-million atom molecular dynamics (MD) simulations of nanoindentation of silicon nitride and amorphization and fracture of silicon diselenide nanowires are performed on massively parallel architectures. System sizes range from 75,803 atoms to over 10 million atoms. The process of amorphization and fracture in silicon diselenide nanowires is followed using configuration space images in smaller wires and local stress and temperature calculations in larger wires. A structural transformation in the nanowire cross sections is investigated. The nanowires are found to contract in one direction perpendicular to the applied strain while expanding in the other, so that initially circular nanowires are transformed to elliptical shapes. 10 million atom MD simulations of nanoindentation of amorphous and crystalline ((0001) surface) silicon nitride are performed. Load-displacement curves are calculated, from which the theoretical hardness and elastic moduli are inferred. These data compare well with currently available experimental data and previous theoretical calculations. Temperature, indentation size, and load-rate dependence are investigated. Local pressure distributions are investigated in the indented films and interpreted with the aid of configuration space images. Brittle indentation fracture is observed in the 1¯21¯0> crystallographic direction. The 101¯0> fracture is more ductile. Pile-up material forms on the surface of the indented films and is maximized along indenter edges and suppressed under the indenter comers. Local bond angle analysis shows that plastically deformed material under the indenter and on the surface is amorphous. Therefore, the mode of plastic deformation in the crystalline silicon nitride nanoindentation simulation is amorphization, which is arrested by either cracking at the indenter comers, or piling-up of material along the indenter edges. Surface adhesion and plastic deformation threshold in silicon nitride are investigated and are related to the onset of hysteresis in load-displacement curves for near-surface contact and small indents. These investigations demonstrate the feasibility of using MD methods to investigate nanoindentation processes in ceramic materials, and to our knowledge, they are the first MD simulations of nanoindentation of a ceramic material having dimensions comparable to the capabilities of modern experiments. These are also the first MD simulations of nanoindentation to observe indentation fracture.
机译:在大规模并行体系结构上进行了氮化硅纳米压痕,二硒化硅纳米线非晶化和断裂的数百万个原子分子动力学(MD)模拟。系统大小从75,803原子到超过1,000万个原子。使用较小导线中的配置空间图像以及较大导线中的局部应力和温度计算来跟踪二硒化硅纳米线的非晶化和断裂过程。研究了纳米线横截面中的结构转变。发现纳米线在垂直于所施加应变的一个方向上收缩而在另一方向上膨胀,使得最初的圆形纳米线转变为椭圆形。进行了无定形和晶体((0001)表面)氮化硅的纳米压痕的一千万个原子MD模拟。计算出载荷-位移曲线,从中可以推断出理论硬度和弹性模量。这些数据与当前可用的实验数据和先前的理论计算结果相比较。研究了温度,压痕尺寸和负载率依赖性。研究压痕薄膜中的局部压力分布,并借助配置空间图像进行解释。在<1’21’0>晶体学方向观察到脆性压痕断裂。 <101’0>断裂更具延展性。堆积的材料会在压痕薄膜的表面上形成,并会沿着压痕边缘最大化,并在压痕角下受到抑制。局部结合角分析表明,在压头下方和表面上发生塑性变形的材料是非晶态的。因此,结晶氮化硅纳米压痕模拟中的塑性变形模式是非晶化,其通过在压头拐角处开裂或沿着压头边缘堆积材料来阻止。研究了氮化硅中的表面粘附力和塑性变形阈值,它们与近表面接触和小凹痕的载荷-位移曲线中的滞后现象有关。这些研究证明了使用MD方法研究陶瓷材料中纳米压痕过程的可行性,并且据我们所知,它们是尺寸可与现代实验能力相媲美的陶瓷材料纳米压痕的首个MD模拟。这也是纳米压痕观察压痕断裂的首个MD模拟。

著录项

  • 作者

    Walsh, Phillip Judson.;

  • 作者单位

    Louisiana State University and Agricultural & Mechanical College.;

  • 授予单位 Louisiana State University and Agricultural & Mechanical College.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.; Computer Science.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 110 p.
  • 总页数 110
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;自动化技术、计算机技术;
  • 关键词

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