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Multimillion atom simulations of nanostructured materials-dynamic fracture, nanoindentation, and oxidation

机译:纳米结构材料的数百万个原子模拟-动态断裂,纳米压痕和氧化

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Multiresolution molecular-dynamics (MRMD) approach for multimillion atom simulations has been used no investigate structural properties, mechanical failure in nanostructured materials, and atomic-level stresses in nanoscale semiconductor/ceramic mesas. Structural transformations under pressure for gallium arsenide and silicon carbide in bulk and nanocrystalline forms are studied. Crack propagation and fracture in silicon nitride, silicon carbide, gallium arsenide, and nanophase ceramics are investigated. We observe a crossover from slow to rapid fracture and a correlation between the speed of crack propagation and morphology of fracture surface. Results of multimillion atom simulations of mechanical behavior of the Si(111)/Si_3N_4(0001) interface, atomic-level stresses in Si(111)/Si_3N_4(0001) and Si(111)/a-Si_3N_4 nanopixels, and nanoindentation of crystalline and amorphous Si_3N_4 films using a rigid, pyramidal indenter will be discussed. Oxidation of aluminum nanoclusters is also investigated with a parallel molecular-dynamics approach based on dynamic charge transfer among atoms.
机译:用于数百万个原子模拟的多分辨率分子动力学(MRMD)方法尚未用于研究结构性质,纳米结构材料中的机械故障以及纳米级半导体/陶瓷台面中的原子级应力。研究了块状和纳米晶形式的砷化镓和碳化硅在压力下的结构转变。研究了氮化硅,碳化硅,砷化镓和纳米相陶瓷中的裂纹扩展和断裂。我们观察到从慢速断裂到快速断裂的过渡,以及裂纹扩展的速度与断裂表面形态之间的相关性。 Si(111)/ Si_3N_4(0001)界面力学行为,Si(111)/ Si_3N_4(0001)和Si(111)/ a-Si_3N_4纳米像素中原子级应力的数百万原子模拟结果以及晶体的纳米压痕将讨论使用刚性金字塔形压头的非晶Si_3N_4薄膜和非晶Si_3N_4薄膜。还使用基于原子间动态电荷转移的平行分子动力学方法研究了铝纳米团簇的氧化。

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