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Self-assembled indium arsenide quantum-dash lasers on indium phosphide substrates.

机译:在磷化铟衬底上的自组装砷化铟量子破折号激光器。

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摘要

A new type of low-dimensional nanostructure—the self-assembled InAs quantum dash—is grown in a strained AlGaInAs quantum well and employed as the active region of lasers on InP substrates with (001) orientation. The quantum dashes are essentially quantum dots, but are elongated along one direction (along [11¯0] in this case). The work presented in this dissertation on the growth and characterization of 1.55 μm range InAs quantum-dash lasers demonstrates the unique properties of these devices.; Characteristics of single-, three-, and five-stack InAs quantum-dash lasers were investigated using a broad-area device structure. Pulsed room temperature operation demonstrates wavelengths from 1.60–1.66 μm, a threshold current density as low as 350 A/cm2, and a distinctly quantum wire-like dependence of the threshold current on the laser cavity orientation. The maximal modal gain for lasing in the ground-state is determined to be 15 cm−1 for single-stack lasers, which is double that of comparable quantum-dot lasers. These self-assembled InAs quantum-dash lasers with emission wavelengths in the new optical fiber L-band and reasonable low thresholds are very promising for wavelength-division-multiplexing (WDM) applications.; A novel processing technology—oxidized ridge waveguide—was developed for InP-based lasers. Five-μm ridges are formed by induced coupled plasma (ICP) etching and wet oxidation to convert p-Al0.48In 0.52As into Al(In)Ox serving as a current-blocking layer. A comparison between this oxidized-ridge-waveguide laser and a conventional ridge waveguide laser is made to show that a 30% higher efficiency and a 30% lower threshold current density are achieved by using this new fabrication method. Electroluminescense (EL) spectrum from an oxide-confined LED shows clearly quantum dot-like discrete energy levels and low energy state saturation. Due to this property, quantum-dash lasers are very desirable to serve as gain chips for tunable lasers.; A 123 nm tuning range from 1.484 μm to 1.607 μm is obtained under cw operation at 15°C by using an external-cavity tunable laser (ECL) with Littrow configuration. The gain chip is a 5-stack quantum-dash oxidized-ridge-waveguide laser with 2.5 mm cavity length and broadband AR-coating (0.15% reflectivity) on one facet. The threshold current density is below 1.1 kA/cm2 for all the tuning wavelengths. This ECL with tunability nearly covering the very important S-, C-, and L-band of Er-doped fiber amplifiers and relatively low threshold is desirable for a dense-wavelength-division-multiplexing (DWDM) tunable light source.; Finally, the transition matrix element theory was used to calculate the ratio of the width to the height of the quantum dash.
机译:一种新型的低维纳米结构-自组装InAs量子破折号-在应变的AlGaInAs量子阱中生长,并用作(001)取向的InP衬底上的激光器的有源区域。量子虚线本质上是量子点,但是沿一个方向(在这种情况下,沿[11 0]方向)伸长。本文对1.55μm范围InAs量子破折号激光器的生长和特性进行的研究证明了这些器件的独特性能。使用广域器件结构研究了单层,三层和五层InAs量子破折号激光器的特性。脉冲室温操作显示出1.60–1.66μm的波长,低至350 A / cm 2 的阈值电流密度,以及阈值电流对激光腔取向的明显量子线状依赖性。对于单堆叠激光器,在基态发射激光的最大模态增益确定为15 cm -1 ,是同类量子点激光器的两倍。这些自组装的InAs量子破折号激光器具有在新的光纤L波段中的发射波长和合理的低阈值,对于波分复用(WDM)应用非常有希望。针对基于InP的激光器开发了一种新颖的处理技术-氧化脊形波导。通过感应耦合等离子体(ICP)蚀刻和湿式氧化形成五微米的脊,以将p-Al 0.48 In 0.52 As转换为Al(In)O x 用作电流阻止层。将该氧化脊波导激光器与常规脊波导激光器进行比较,结果表明,通过使用这种新的制造方法,可以使效率提高30%,阈值电流密度降低30%。来自氧化物限制的LED的电致发光(EL)光谱清楚地显示出类似量子点的离散能级和低能态饱和度。由于这种特性,非常希望将量子破折号激光器用作可调谐激光器的增益芯片。通过使用具有Littrow配置的外腔可调激光器(ECL),在15°C的连续工作状态下,可以获得1.484μm至1.607μm的123 nm调谐范围。增益芯片是一个5层量子点氧化脊波导激光器,其腔长为2.5 mm,在一个小面上具有宽带增透膜(反射率0.15%)。所有调谐波长的阈值电流密度均低于1.1 kA / cm 2 。具有可调谐性的这种ECL几乎覆盖了掺Er光纤放大器的非常重要的S,C和L波段,并且阈值相对较低,对于密集波分复用(DWDM)可调光源是理想的。最后,使用过渡矩阵元理论来计算量子破折号的宽度与高度之比。

著录项

  • 作者

    Wang, Ronghua.;

  • 作者单位

    The University of New Mexico.;

  • 授予单位 The University of New Mexico.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2002
  • 页码 150 p.
  • 总页数 150
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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