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The wetting characteristics and diffusive growth of precursing films in single and multicomponent metallic systems.

机译:单组分和多组分金属体系中前固化膜的润湿特性和扩散生长。

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摘要

In this thesis, we both address two longstanding questions in the wetting literature and reveal new quantitative features of surface diffusion in pure and alloyed metallic systems. By studying equilibrium wetting and precursing film growth kinetics experimentally in Pb, Bi and a Pb-Bi alloy on Cu(111), and by atomistic computer simulation for Ag on Ni(100), we have given the first clear recognition of pseudo-partial wetting—a thin film in equilibrium with a macroscopic body having a non-zero contact angle—in the literature and show that the mass transport mechanism during the film growth is diffusive. In addition, our detailed, spatially and temporally resolved compositional studies of the films, allows us to reconstruct the diffusion coefficient as a function of concentration for the pure Pb and Bi on Cu(111) systems. We connect those concentration dependence variations with surface structure. In the case of Pb-Bi on Cu(111), such reconstruction is not yet possible, but we observe the clear impact of the interaction between the species on the diffusive transport in the film.; The UHV apparatus and our sample geometries provide us with unique capabilities to study wetting and diffusion. It affords us both a clean environment and electron beam based diagnostic tools. The cleanliness of the UHV environment allows us to study wetting phenomena without the complexities of contact angle hysteresis and of solutal Maragoni flows that likely occur due to contamination in an ambient environment. Due to the exceedingly low vapor pressure of our systems, evaporation is negligible, simplifying both the film and contact angle behaviors. In our Pb-Bi alloy system, the low vapor pressures also remove the possibility of differential evaporation of various components which can cause instabilities in contact lines or dominate transport in precursing films. The Auger electron based spectroscopy characterization tools allow measurement of composition and density within the precursing film at submicron resolution. Thus, we can characterize the film growth by tracking the full compositional profile as it evolves with time. Finally, the nonzero contact angle of the systems investigated here ensures that the advancing contact line of a spreading drop is not influencing the film growth.
机译:在本文中,我们都解决了润湿文献中两个长期存在的问题,并揭示了纯金属和合金金属系统中表面扩散的新定量特征。通过实验研究Cu(111)上Pb,Bi和Pb-Bi合金的平衡润湿和先驱膜生长动力学,并通过Ni(100)上Ag的原子计算机模拟,我们首次清楚地认识到伪部分湿润(与具有非零接触角的宏观物体保持平衡的薄膜)在文献中表明,薄膜生长过程中的质量传输机制具有扩散性。此外,我们对薄膜进行的详细的,时空分辨的成分研究,使我们能够重建铜(111)系统上纯Pb和Bi的扩散系数,作为浓度的函数。我们将这些浓度依赖性变化与表面结构联系起来。对于在Cu(111)上的Pb-Bi,这种重构尚不可能,但是我们观察到物种之间的相互作用对薄膜中的扩散传输具有明显的影响。超高压设备和我们的样品几何形状为我们提供了研究润湿和扩散的独特能力。它为我们提供了清洁的环境和基于电子束的诊断工具。特高压环境的清洁度使我们能够研究润湿现象,而不会因周围环境的污染而发生复杂的接触角滞后和Maragoni流动。由于我们系统的蒸气压极低,因此蒸发可以忽略不计,从而简化了薄膜和接触角的行为。在我们的Pb-Bi合金系统中,低蒸气压还消除了各种成分差异蒸发的可能性,这些成分可能引起接触线的不稳定性或主导预固化膜的传输。基于俄歇电子学的光谱表征工具可在亚微米分辨率下测量预固化膜中的成分和密度。因此,我们可以通过跟踪随着时间变化的整个构图来表征胶片的生长。最后,此处研究的系统的非零接触角可确保铺展液滴的前进接触线不会影响薄膜的生长。

著录项

  • 作者

    Moon, Jaehyun.;

  • 作者单位

    Carnegie Mellon University.;

  • 授予单位 Carnegie Mellon University.;
  • 学科 Engineering Materials Science.; Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 2003
  • 页码 162 p.
  • 总页数 162
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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