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LO-plasmon modes in doped gallium arsenide/aluminum gallium arsenide superlattices.

机译:掺杂的砷化镓/砷化铝镓超晶格中的本征等离子体模式。

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摘要

A great deal of interest has emerged in recent years to design novel compound semiconductor materials to fulfill the growing societal needs of efficient light sources, powerful solar cells, miniaturized-electronic-circuitry for lab-on-chip equipment, and a plethora of handheld opto-electronic devices. GaAs-based III-V compounds are significant materials with important fundamental characteristics allowing the scientists and engineers to envision their use in a variety of devices including light-emitting diodes (LEDs), laser diodes (LDs), and high-electron mobility transistors (HEMTs).;In this regard, there has been a growing interest of studying the far-infrared optical properties in both un-doped and doped bulk III-V compounds, thin films, ternary alloys, and their nano-structured quantum-wells and superlattices. For GaAs/AlxGa1-xAs materials grown especially by molecular-beam epitaxy (MBE), the optical constants [viz., n, k, N (Charge carrier concentration), R (Reflection), and T (Transmission)] over a broad frequency regime are fundamental inputs that must be known for constructing opto-electronic devices. Despite some success by using Raman Spectroscopy, the influence of free charge carrier concentration on the phonon-plasmon coupled modes (L+/-) by far-infrared (FIR) spectroscopy are still scantily known. Any effort to extract accurate information about the charge carrier concentration N in either n- or p-type doped III-V compounds using FIR would be of significant importance to the scientific community.;In this thesis, we will use the electromagnetic theory to study the IR reflectivity and transmission at oblique incidence in both undoped and doped GaAs, AlxGa1-xAs thin films and superlattices in order to correlate the shifts of the L+/- mode frequencies with the free charge carrier concentration. The transmission study in compound semiconductors for s-polarization reveals a single minimum at the resonance frequency of the TO mode, while for p-polarization the transmission minima occur at both the resonance frequencies of the TO and LO modes. In doped semiconductor thin films, the transmission in p-polarization exhibits minima at TO and L+ with a shift of L+ mode to higher frequency as the charge carrier concentration increases.
机译:近年来,人们对设计新颖的化合物半导体材料产生了浓厚的兴趣,这些材料可以满足社会对高效光源,功能强大的太阳能电池,用于芯片实验室设备的小型化电子电路以及众多手持式光电器件不断增长的需求。 -电子设备。基于GaAs的III-V化合物是具有重要基本特征的重要材料,使科学家和工程师可以设想将它们用于各种器件,包括发光二极管(LED),激光二极管(LD)和高电子迁移率晶体管(在这方面,对研究未掺杂和掺杂的块状III-V族化合物,薄膜,三元合金及其纳米结构量子阱和纳米结构的远红外光学性能的兴趣日益浓厚。超晶格。对于特别是通过分子束外延(MBE)生长的GaAs / AlxGa1-xAs材料,其光学常数[即,n,k,N(电荷载流子浓度),R(反射率)和T(透射率)]频率范围是构造光电设备必须知道的基本输入。尽管通过使用拉曼光谱法取得了一些成功,但是,通过远红外(FIR)光谱对自由电荷载流子浓度对声子-等离子体激元耦合模式(L +/-)的影响仍然知之甚少。使用FIR提取有关n型或p型掺杂III-V化合物中载流子浓度N的准确信息的任何努力对于科学界来说都是至关重要的;在本文中,我们将使用电磁理论来研究在未掺杂和掺杂的GaAs,AlxGa1-xAs薄膜和超晶格中,斜入射时的IR反射率和透射率,以使L +/-模式频率的偏移与自由电荷载流子浓度相关联。对于s极化的复合半导体传输研究表明,在TO模式的谐振频率处有一个最小值,而对于p极化,在TO模式和LO模式的谐振频率处都存在传输最小值。在掺杂的半导体薄膜中,随着电荷载流子浓度的增加,p极化的透射率在TO和L +处呈现最小值,随着L +模式向更高频率的偏移。

著录项

  • 作者

    Rodgers, Robert A.;

  • 作者单位

    Indiana University of Pennsylvania.;

  • 授予单位 Indiana University of Pennsylvania.;
  • 学科 Physics Condensed Matter.
  • 学位 M.S.
  • 年度 2011
  • 页码 73 p.
  • 总页数 73
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 宗教 ;
  • 关键词

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