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Fabrication of Chemical Sensors, Optical Detectors, and Optical Sources From Metal Nanogap Structures.

机译:从金属纳米间隙结构制造化学传感器,光学检测器和光源。

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摘要

With the continuing miniaturization of functional devices, nano-structured materials have become of significant scientific and practical interest. In this dissertation, we created a nanogap in silver (Ag) nanowires or electrodeposited nanocrystalline cadmium selenide (nc-CdSe) into FIB cut gold nanogaps and explored their applications for chemical sensors, optical detectors and optical sources.;In the first part, the formation of a nanometer-scale chemically responsive junction (CRJ) within a silver nanowire is described. A single Ag nanowire was first prepared on glass using the lithographically patterned nanowire electrodeposition (LPNE) method. Then a 1-5 nm nanogap was created by electromigration and reconnected by applying a voltage ramp across the nanowire resulting in the formation of a resistive (MegaOhms), ohmic CRJ. The resistance changes upon exposure to ammonia (NH3), nitrogen dioxide (NO2) and water vapor have been studied. The proposed mechanism of the enhanced resistance response for a CRJ, supported by Density Function Theory (DFT) calculations is that semiconducting p-type AgxO is formed within the CRJ and the binding of molecules to this AgxO modulates its electrical resistance.;In the second part, nc-CdSe was electrodeposited within a sub-50 nm electromigrated gold nanogap, to form a photoconductive metal-semiconductor-metal (M-S-M) nanojunction. The photoconductivity of these nc-CdSe-lled gold nanogaps was characterized by a detectivity of 6.9 × 10 10 Jones and a photosensitivity of 500. These devices also demonstrated a maximum photoconductive gain of ∼45 and response and recovery times below 2 μs, corresponding to a 3 dB bandwidth of at least 175 kHz.;In the third part, similar nc-CdSe based M-S-M nanojunctions as in the above photodetector case were demonstrated to be able to emit near-infrared light with a threshold voltage right above the bandgap of CdSe ∼1.7 V. Two different deposition temperatures (20 °C versus 75 °C) were used and the resulting device performance indicated that the bigger the grain size (75 °C), the higher the electroluminescence (EL) efficiency. Voltage dependent EL spectra revealed that light emission occurred through inelastic scattering of tunneling electrons from band-edge and defect states transitions.
机译:随着功能器件的持续小型化,纳米结构材料已变得具有重大的科学和实践意义。在本文中,我们将银(Ag)纳米线中的纳米间隙或电沉积的纳米晶硒化镉(nc-CdSe)制成FIB切割的金纳米间隙,并探讨了它们在化学传感器,光学探测器和光源中的应用。描述了在银纳米线内形成纳米级化学响应结(CRJ)的方法。首先使用光刻图案化的纳米线电沉积(LPNE)方法在玻璃上制备一条Ag纳米线。然后,通过电迁移产生1-5 nm的纳米间隙,并通过在纳米线上施加电压斜坡来重新连接,从而形成电阻性(MegaOhms)欧姆CRJ。已经研究了暴露于氨(NH3),二氧化氮(NO2)和水蒸气时的电阻变化。密度泛函理论(DFT)计算支持所提出的CRJ增强电阻响应的机制是,在CRJ内形成了半导体p型AgxO,分子与该AgxO的结合调节了其电阻。部分,将nc-CdSe电沉积在低于50 nm的电迁移金纳米间隙中,以形成光电导金属-半导体-金属(MSM)纳米结。这些nc-CdSe填充的金纳米间隙的光电导性具有6.9×10 10 Jones的探测灵敏度和500的光敏性。这些器件还显示出约45的最大光电导增益以及低于2μs的响应和恢复时间,对应于3 dB的带宽至少为175 kHz。第三部分,证明了与上述光电探测器中类似的基于nc-CdSe的MSM纳米结能够发射近红外光,其阈值电压正好高于CdSe的带隙约1.7V。使用了两种不同的沉积温度(20°C与75°C),所得器件性能表明,晶粒尺寸(75°C)越大,电致发光(EL)效率越高。与电压有关的EL光谱表明,发光是通过带边电子和缺陷态跃迁的隧穿电子的非弹性散射而发生的。

著录项

  • 作者

    Xing, Wendong.;

  • 作者单位

    University of California, Irvine.;

  • 授予单位 University of California, Irvine.;
  • 学科 Nanoscience.;Nanotechnology.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 135 p.
  • 总页数 135
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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