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Thermal, residual stress and contact reliability of RF MEMS: Fundamental physics and improvements.

机译:RF MEMS的热,残余应力和接触可靠性:基本物理原理和改进。

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摘要

Radio frequency micro-electromechanical systems (RF MEMS) have been envisioned to be ideal devices for future wireless applications over a decade; however, they still suffer from their limited reliability. This results from inadequate understandings to the governing phenomena. The device performance is normally limited by three main problems: self-heating, residual stress, and contact reliability. This thesis studies the associated dominant phenomena using representative devices/structures, and proposes technological solutions.; The thesis first discovers that skin-effect self-heating causes premature buckling to air-suspended (or microshield) transmission line structures. A new analytical model and experimental technique are established. Hence, increasing the thickness from 1 to 3 microns of a typical transmission line can enhance a 25-fold power handling.; Secondly, the thesis addresses the residual stress problem in fabrication. Sputtering is commonly-used in deposit structural film deposition; nonetheless, residual stress makes thick film sputtering impossible. A new low stress sputtering technique is developed. Thus, inserting 6 cooling intervals in sputtering mitigates gold residual stress from 203 MPa to 40 MPa.; Thirdly, the thesis studies the contact failures of direct contact switches: unstable contact resistance, slow switching time, and low power handling at certain lifetime. A switch operational condition and a new contact micro-structure are proposed. Also, some new phenomena discovered include gold nanowire formation and multiple-to-single electrical conduction transition at the contacts.; Incorporating these three reliability studies, a new direct contact RF MEMS switch with Ball-Grid-Array (BGA) dimples has been designed, mass-fabricated and evaluated in DC and RF performance. To our knowledge, it is the first RF MEMS direct contact switch using conventional fabrication process (1-micron UV lithography, 99.99% sputtered gold, 160 °C process temperature), having fast opening of 2 micro-seconds, and closing of 50 micro-seconds, low contact resistance of 0.7 O, and low insertion loss (DC to 20 GHz) of -0.1 dB, at >1W RF power handling for >100 million hot-switching cycles!; The specific devices studied here, i.e., transmission lines and direct contact switches, are the building blocks for many RF MEMS applications such as reconfigurable antenna. Therefore, this fundamental knowledge can well provide a general insight into reliability improvement for RF MEMS technology development.
机译:射频微机电系统(RF MEMS)已被设想为十年后未来无线应用的理想设备。但是,它们仍然受其有限的可靠性的困扰。这是由于对治理现象的理解不足。器件的性能通常受到三个主要问题的限制:自发热,残余应力和接触可靠性。本文利用代表性的器件/结构研究了相关的显性现象,并提出了技术解决方案。论文首先发现,皮肤效应自热会导致空气悬浮(或微屏蔽)传输线结构过早屈曲。建立了新的分析模型和实验技术。因此,将典型传输线的厚度从1微米增加到3微米可以增强25倍的功率处理能力。其次,解决了制造过程中的残余应力问题。溅射通常用于沉积结构膜的沉积。然而,残余应力使得不可能进行厚膜溅射。开发了一种新的低应力溅射技术。因此,在溅射中插入6个冷却间隔可以将金残余应力从203 MPa降低到40 MPa。第三,本文研究了直接接触开关的接触故障:接触电阻不稳定,切换时间慢以及在一定寿命内的低功耗处理。提出了一种开关操作条件和一种新的触头微观结构。另外,发现了一些新现象,包括金纳米线的形成和触头处的多对单导电过渡。结合这三个可靠性研究,设计,批量制造并评估了直流和射频性能的新型带有球形栅格(BGA)凹痕的新型直接接触RF MEMS开关。据我们所知,这是第一款使用常规制造工艺(1微米UV光刻,99.99%的溅镀金,<160°C的加工温度)的RF MEMS直接接触开关,具有<2微秒的快速打开和闭合时间。 <50微秒,0.7 O的低接触电阻,-0.1 dB的低插入损耗(DC至20 GHz),-> 1W RF功率时,可进行超过1亿次热切换!此处研究的特定设备,即传输线和直接接触开关,是许多RF MEMS应用(例如可重构天线)的基础。因此,此基础知识可以很好地为RF MEMS技术开发的可靠性提高提供一般见识。

著录项

  • 作者

    Chow, Lok Wan.;

  • 作者单位

    University of Michigan.;

  • 授予单位 University of Michigan.;
  • 学科 Engineering Electronics and Electrical.; Engineering Mechanical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 142 p.
  • 总页数 142
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;机械、仪表工业;
  • 关键词

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