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Growth of AiN single crystals

机译:AiN单晶的生长

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摘要

Aluminum nitride is a wurtzite structure III-V compound, although epitaxial layers of zincblende structure AlN have been made. AlN melts congruently at 2750 deg with dissociation pressure of 9 atmospheres. Boules of AlN have been successfully grown by a sublimation-recondensation technique at 2300 deg employing tungsten crucibles. Growth rates of 0.3 mm per hour were attained at 1 bar pressure of N_2, and crystals up to 22 mm long have been grown. An analysis of the growth process shows that the 9.75eV dissociation energy of N_2 is the limiting factor in the growth rate. The growth rate is predicted to depend on the N_2 pressure, but no experiments in this area have yet been concluded. The most satisfactory crucible material found so far for growing AlN is single crystal tungsten.
机译:氮化铝是纤锌矿结构的III-V族化合物,尽管已经制造了闪锌矿结构AlN的外延层。 AlN在9750个大气压下的解离压力下在2750度完全熔化。通过使用钨坩埚在2300度下通过升华-再冷凝技术成功地生长了AlN球团。在1 bar的N_2压力下,每小时的生长速度为0.3毫米,并且晶体长到22毫米。生长过程的分析表明,N_2的9.75eV离解能是生长速率的限制因素。预计生长速率取决于N_2压力,但尚未完成该领域的实验。迄今为止发现的用于生长AlN的最令人满意的坩埚材料是单晶钨。

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