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Bulk breakdown in AlGaN/GaN HFETs

机译:AlGaN / GaN HFET的整体击穿

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摘要

A significant source current generated by a carrier multiplication process is observed at large drain voltages in the subthreshold regime, along with simulataneous increase of the gate current and light emission signal. Provided no on-surface premature breakdown takes place, a bulk channel avalanche breakdown process is proposed as the dominant breakdown mechanism for a large range of gate-to-source de voltages. This process in the GaN channel is responsible for the excess source and drain currents, light emission, and excess gate current beyond its normal value measured ina gate-to-drain diode configuration. The role of the gate bias in controlling the channel vs.the gate breakdown mechanisms is described.
机译:在亚阈值状态下,在较大的漏极电压下会观察到由载流子倍增过程产生的大量源极电流,同时栅极电流和发光信号也同时增加。如果没有发生表面上的过早击穿,建议采用大沟道雪崩击穿工艺作为大范围栅-源极降压的主要击穿机理。 GaN沟道中的这一过程导致了过大的源极和漏极电流,光发射以及超出栅极至漏极二极管配置所测量的正常值的栅极电流。描述了栅极偏置在控制沟道与栅极击穿机制中的作用。

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