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MECHANICAL PROPERTIES OF CrN FILMS DEPOSITED BY MAGNETRON SPUTTERING METHOD

机译:磁控溅射沉积CrN薄膜的力学性能

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摘要

The mechanical properties of CrN films coated by radio frequency (rf) magnetron sputtering method were investigated. CrN films were coated on stainless steel, silicon wafer and glass substrates using sputtering of a Cr target in nitrogen ambient. The films were coated by varying the deposition temperature, nitrogen partial pressure and rf power density. The films coated were characterized by nanoindentation method, microhardness, optical, and corrosion tests. In order to use CrN as mechanical coating material, the surface roughness, hardness and adhesion properties have to be determined. The film properties were measured using atomic force microscopy and nanoindentation method and analyzed as a function of deposition conditions. It was found that these properties can be varied by changing the deposition conditions.
机译:研究了射频(rf)磁控溅射法涂覆CrN薄膜的力学性能。通过在氮气环境中溅射Cr靶,在不锈钢,硅片和玻璃基板上涂覆CrN薄膜。通过改变沉积温度,氮分压和rf功率密度来涂覆膜。通过纳米压痕法,显微硬度,光学和腐蚀测试来表征涂覆的膜。为了使用CrN作为机械涂层材料,必须确定表面粗糙度,硬度和附着力。使用原子力显微镜和纳米压痕法测量膜性能,并根据沉积条件对其进行分析。发现可以通过改变沉积条件来改变这些性质。

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