首页> 外文会议>International Conference on Transparent Optical Networks;ICTON '09 >Comparative analysis of various methods to reach the 1.3-µm emission in GaInNAs/GaAs QW VCSELs
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Comparative analysis of various methods to reach the 1.3-µm emission in GaInNAs/GaAs QW VCSELs

机译:GaInNAs / GaAs QW VCSEL中达到1.3μm发射的各种方法的比较分析

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Three methods to obtain in GaAs-based oxide-confined GaInNAs/GaAs quantum-well (QW) VCSELs an efficient emission of the 1.3-mum radiation have been analysed and compared with the aid of the comprehensive fully self-consistent model. In the tuned VCSEL, QW composition (high N content) and thickness are selected to tune the 1.3-mum emission which ensures low threshold currents. However, manufacturing of such N-rich GaInNAs layers and/or such thin QWs threatens with generation of structure defects or even cracking. The 1.3-mum emission may be also forced in VCSELs with lower nitride QW content by the cavity appropriately detuned with respect to the active-region gain spectrum. Such a detuned VCSEL exhibits excellent properties at elevated ambient temperatures whereas its operation at room temperature may be reached at the price of a very high lasing threshold only. Introducing inter-mediate layers of lower energy gaps on both QW sides also enables reaching the tuned 1.3-mum lasing emission in VCSELs with lower QW nitride content. However, this QW-modified VCSEL is more sensitive to temperature increases and its lasing operation is stopped at higher temperatures. Therefore it may be concluded, that a choice of the most appropriate active region structure depends on a particular VCSEL application.
机译:在全面的完全自洽模型的帮助下,分析并比较了三种在基于GaAs的氧化物限制的GaInNAs / GaAs量子阱(QW)VCSEL中获得有效发射1.3微米辐射的方法。在调谐的VCSEL中,选择QW成分(高N含量)和厚度来调谐1.3微米的发射,从而确保低阈值电流。然而,制造这种富含N的GaInNAs层和/或这种薄的QW会威胁到结构缺陷甚至破裂的产生。在具有较低氮化物QW含量的VCSEL中,也可以通过相对于有源区增益谱适当失谐的空腔来强制1.3mm的发射。这种失谐的VCSEL在升高的环境温度下表现出优异的性能,而在室温下的工作仅需非常高的激光阈值即可实现。在QW两侧引入较低能隙的中间层还可以在QW氮化物含量较低的VCSEL中达到调谐的1.3微米激光发射。但是,这种经QW改性的VCSEL对温度升高更加敏感,并且其激光发射操作在较高温度下停止。因此可以得出结论,最合适的有源区结构的选择取决于特定的VCSEL应用。

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