首页> 外文会议>Thirteenth European Conference on Chemical Vapor Deposition, Aug 26-31, 2001, Glyfada, Athens, Greece >Chemical vapour deposition ― a promising method for production of different kinds of carbon nanotubes
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Chemical vapour deposition ― a promising method for production of different kinds of carbon nanotubes

机译:化学气相沉积-一种生产各种碳纳米管的有前途的方法

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Carbon nanostructures (fibres, multi and single walled tubes) have been synthesized by catalytic chemical vapour deposition. The catalyst material, deposition temperature and the used hydrocarbon are the main parameters responsible for the formation of the desired structure. In dependence on these parameters and by optimising the deposition process nanofibres with herringbone structure and tubular multiwalled nanotubes were deposited in large amounts and high purity. In the case of single wall nanotubes synthesis an aftertreatment and process is absolutely necessary to obtain material with high percentage of tubes. Layers of disordered and aligned multiwalled nanotubes were deposited on oxidised silicon substrates coated with thin sputtered metal layers (Co, permalloy) by using the micro-wave assisted plasma CVD process or the bias supported hot filament CVD method. The latter method allows relatively low deposition temperatures (550 ― 750℃). The obtained carbon modifications were characterised by scanning and transmission electron microscopy. Furthermore, the electron field emission of the CNT's layers were investigated.
机译:碳纳米结构(纤维,多壁和单壁管)已通过催化化学气相沉积法合成。催化剂材料,沉积温度和所用烃是负责形成所需结构的主要参数。根据这些参数并通过优化沉积工艺,大量且高纯度地沉积了具有人字形结构的纳米纤维和管状多壁纳米管。在单壁纳米管合成的情况下,绝对需要后处理和工艺来获得具有高百分比的管的材料。通过使用微波辅助等离子体CVD工艺或偏压支撑热丝CVD方法,将无序排列的多壁纳米管层沉积在涂有薄溅射金属层(Co,坡莫合金)的氧化硅基板上。后一种方法允许相对较低的沉积温度(550〜750℃)。通过扫描和透射电子显微镜表征所获得的碳修饰。此外,研究了CNT层的电子场发射。

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