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首页> 外文期刊>Journal de Physique, IV: Proceedings of International Conference >Chemical vapour deposition - a promising method for production of different kinds of carbon nanotubes
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Chemical vapour deposition - a promising method for production of different kinds of carbon nanotubes

机译:化学气相沉积-一种生产各种碳纳米管的有前途的方法

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Carbon nanostructures (fibres, multi and single walled tubes) have been synthesized by catalytic chemical vapour deposition. The catalyst material, deposition temperature and the used hydrocarbon are the main parameters deposition process nanofibres with herringbone structure and tubular multiwalled nanotubes were deposited in large amounts and high purity. In the case of single wall nanotubes synthesis an aftertreatment and process is absolutely necessary to obtain material with high percentage of tubes. Layers of disordered and aligned multiwalled nanotubes were deposited on oxidized silicon substrates coated with thin sputtered metal layers (Co, permalloy) by using the micro-wave assisted plasma CVD process or the bias supported hot filament CVD method. The latter method allows relatively low deposition temperatures (550-750 ℃). The obtained carbon modifications were characterized by scanning and transmission electron microscopy. Furthermore, the electron field emission of the CNT's layers were investigated.
机译:碳纳米结构(纤维,多壁和单壁管)已通过催化化学气相沉积法合成。催化剂材料,沉积温度和所用烃是人字形结构纳米纤维沉积工艺的主要参数,管状的多壁纳米管被大量,高纯度地沉积。在单壁纳米管合成的情况下,绝对必需进行后处理和工艺,以获得具有高百分比的管的材料。通过使用微波辅助等离子体CVD工艺或偏置支持热丝CVD方法,将无序排列的多壁纳米管层沉积在涂有薄溅射金属层(Co,坡莫合金)的氧化硅基板上。后一种方法允许较低的沉积温度(550-750℃)。通过扫描和透射电子显微镜表征所获得的碳修饰。此外,研究了CNT层的电子场发射。

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