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Dynamic processes of InAs quantum-dots growth observed by reflectance-differnce spectroscopy

机译:反射差光谱法观察InAs量子点生长的动态过程

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When InAs is deposited on GaAs(001) by molecular-beam epitaxy, three-dimensional islands, i.e., quantum-dots, are grown by the Stranski-Krastanov mode. The critical thickness for the growth-mode transition is about one monolayer (ML). Therefore, understanding of the growth mechanism in atomic scale is considered to be necessary. In this study, we focus our attention on the growth-mode transition from the two-dimensional layer-by-layer growth to the three-dimensional island growth. Reflectance-difference (RD) spectroscopy and reflection high-energy electron diffraction (RHEED) measurements have been performed during growth to investigate a relation between the surface-reconstructured structure and the growth mode.
机译:当InAs通过分子束外延沉积在GaAs(001)上时,通过Stranski-Krastanov模式生长三维岛,即量子点。生长模式转变的临界厚度约为一个单层(ML)。因此,认为有必要了解原子级的生长机理。在这项研究中,我们将注意力集中在从二维逐层增长到三维岛增长的增长模式转变上。生长过程中进行了反射差(RD)光谱和反射高能电子衍射(RHEED)测量,以研究表面重构结构与生长模式之间的关系。

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