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Spectroscopic study of nanocrystalline TiO_2 thin films grown by atomic layer deposition

机译:原子层沉积法制备纳米TiO_2薄膜的光谱研究

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Photoluminescence characteristics of nanocrystalline TiO_2 films grown by atomic layer deposition were studied. In dependence of growth conditions the films consisted of anatase, rutile and TiO_2-II phases. A broad band and two sharp peaks were observed in the photoluminescence spectra measured under continuous-wave Ar~+ laser excitation at temperatures 5-165 K. At 5 K the maximum of the broad band was at 2.24 eV in the anatase films, and at 2.37-2.40 eV in the rutile and TiO_2-II films. The intensity of sharp lines peaking at 3.31 and 3.37 eV depended on the crystal structure of the films and increased significantly after X-ray irradiation. The temperature dependence and decay times of different emission bands were also investigated. The data obtained allowed a defect-trapped-exciton interpretation of the sharp peaks although the free-exciton origin of the 3.31 eV peak could still be argued. The broad-band emission at 2.24-2.40 eV was obviously due to self-trapped exciton recombination.
机译:研究了原子层沉积生长的纳米TiO_2薄膜的光致发光特性。根据生长条件,薄膜由锐钛矿相,金红石相和TiO_2-II相组成。在连续波Ar〜+激光激发下于5-165 K的温度下测得的光致发光光谱中观察到一个宽带峰和两个尖峰。在5 K时,锐钛矿薄膜的最大带宽为2.24 eV,在金红石和TiO_2-II薄膜中为2.37-2.40 eV。尖峰线的强度在3.31和3.37 eV处达到峰值,这取决于薄膜的晶体结构,并且在X射线照射后明显增加。还研究了不同发射带的温度依赖性和衰减时间。尽管仍然可以争论3.31 eV峰的自由激子起源,但获得的数据允许对尖峰进行缺陷捕获的激子解释。 2.24-2.40 eV处的宽带发射显然是由于自陷激子复合引起的。

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