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Shape, size, strain and correlations in quantum dot systems studied by grazing incidence X-ray scattering methods

机译:通过掠入射X射线散射方法研究量子点系统中的形状,大小,应变和相关性

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We present results obtained by grazing incidence X-ray scattering methods on three different semiconductor heterostructures containing 3D islands ('quantum dots'). We show that the combination of the depth sensitivity of these methods and the use of synchrotron radiation allows for a full structural characterisation of the quantum dots. All samples systems were grown by molecular beam epitaxy. (1) Ge (15nm) deposited on boron terminated Si(111) surfaces is shown to form relaxed triangular Ge pyramids with no orientaional dispersion. We demonstrate how the 3-fold symmetry is obtained. (2) In the case of coherent InAs islands grown on GaAs(100), grazing incidence diffraction between the (220) surface reflections of InAs and GaAs reveals that the quantum dots are pseudmorphically strained at the interface to the substrate while they become fully relaxed at the top of the islands. In a novel approach ('iso-strain scattering') we are able to determine the interdependence of radius and strain in the dots which turns out to be linear. (3) In the third example of coherent Ge islands embedded in a Si/Ge superlattice we find correlations both laterally and in the growth direction. On the surface the dots are organised in a short range order square lattice. By increasing the scattering depth to investigate the superlattice, we find the buried Ge dots to be strongly correlated in the growth direction. Surface sensitive X-ray techniques using grazing incidence and exit angles have been turned into a versatile tool to study structural properties of quantum dots which are essential for understanding their self-organised growth and quantum confinement effects.
机译:我们介绍了通过掠入射X射线散射方法对包含3D岛(“量子点”)的三种不同半导体异质结构获得的结果。我们表明,这些方法的深度灵敏度和同步辐射的使用相结合,可以对量子点进行完整的结构表征。所有样品系统均通过分子束外延生长。 (1)显示沉积在硼终止的Si(111)表面上的Ge(15nm)形成没有取向分散的弛豫三角形Ge金字塔。我们演示了如何获得3倍对称性。 (2)在GaAs(100)上生长有相干InAs岛的情况下,InAs和GaAs的(220)表面反射之间的掠入射衍射表明,量子点在完全松弛的情况下在与衬底的界面上呈拟晶形应变。在岛屿的顶部。在一种新颖的方法(“等应变散射”)中,我们能够确定半径和应变在点中的相互依赖性,结果证明它们是线性的。 (3)在嵌入在Si / Ge超晶格中的相干Ge岛的第三个例子中,我们发现了横向和生长方向的相关性。在表面上,点以短程有序的方格组织。通过增加散射深度来研究超晶格,我们发现掩埋的锗点在生长方向上具有很强的相关性。使用掠射入射角和出射角的表面敏感X射线技术已成为研究量子点结构特性的多功能工具,这对于理解量子点的自组织生长和量子限制效应至关重要。

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