首页> 外文会议>Testing, Reliability, and Application of Micro- and Nano-Material Systems III >Photoacoustic characterization of the mechanical properties of thin film materials
【24h】

Photoacoustic characterization of the mechanical properties of thin film materials

机译:薄膜材料机械性能的光声表征

获取原文
获取原文并翻译 | 示例

摘要

Two high frequency photoacoustic techniques were applied to investigate the mechanical properties of two sets of thin film materials in this work. Broadband photoacoustic guided-wave method was used to measure the guided-wave phase velocity dispersion curves of nano-structured diamond-like carbon hard coatings. The experimental velocity spectra were analyzed by a nonlinear optimization approach in conjunction with a multi-layer wave-propagation model. The derived Young's moduli using the broadband photoacoustic technique were compared with line-focus acoustic microscopy and nano-indentation tests and good quantitative agreement is found. In a second set of experiments, ultra-thin two-layer aluminum and silicon nitride thin film materials were tested using the femtosecond transient pump-probe method using high frequency bulk waves generated by the ultra-fast laser pulses. The measured moduli of silicon nitride thin layers are in the range of 270 - 340 GPa. Photoacoustic methods are shown to be suitable for in-situ and non-destructive evaluation of the mechanical properties of thin films.
机译:在这项工作中,应用了两种高频光声技术来研究两组薄膜材料的机械性能。采用宽带光声导波法测量了纳米结构类金刚石硬质涂层的导波相速度色散曲线。通过非线性优化方法结合多层波传播模型对实验速度谱进行了分析。将使用宽带光声技术得到的杨氏模量与线聚焦声显微镜和纳米压痕测试进行了比较,发现了良好的定量一致性。在第二组实验中,使用飞秒瞬态泵浦探针法,使用由超快激光脉冲产生的高频体波,测试了超薄的两层铝和氮化硅薄膜材料。测得的氮化硅薄层的模量在270-340 GPa的范围内。显示出光声方法适合于原位和非破坏性评估薄膜的机械性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号